SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 349, Issue 1, 1999, Pages 230-237

Annealing ultra thin Ta2O5 films deposited on bare and nitrogen passivated Si(100)

(8) Mao, A Y a Son, K A a Hess, D A a Brown, L A a White, J M a Kwong, D L a Roberts, D A b Vrtis, R N b

a UNIVERSITY OF TEXAS AT AUSTIN (United States)

b AIR PRODUCTS AND CHEMICALS INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DEPOSITION; DIELECTRIC FILMS; INTERFACES (MATERIALS); PASSIVATION; SECONDARY ION MASS SPECTROMETRY; SILICON; TANTALUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

BURIED INTERFACES; VACUUM-SOLID INTERFACES;

ULTRATHIN FILMS;

EID: 0032651884 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(99)00181-9 Document Type: Article

Times cited : (22)

References (40)

1
- 0345909576
- G. Wilk, SPIE 3212 (1997) 42.
- (1997) SPIE , vol.3212 , pp. 42
- Wilk, G.¹

2
- 0029390687
- J.L. Autran, P. Paillet, J.L. Leray, R.A.B. Devine, Sensors and Actuators A 51 (1995) 5.
- (1995) Sensors and Actuators A , vol.51 , pp. 5
- Autran, J.L.¹ Paillet, P.² Leray, J.L.³ Devine, R.A.B.⁴

3
- 33646335661
- H. Shinriki, T. Kisu, S. Kimura, Y. Nishioka, Y. Kawamoto, K. Mukai, IEEE Trans. Electron Devices (1990) 37.
- (1990) IEEE Trans. Electron Devices , pp. 37
- Shinriki, H.¹ Kisu, T.² Kimura, S.³ Nishioka, Y.⁴ Kawamoto, Y.⁵ Mukai, K.⁶

4
- 0027624729
- N. Rausch, E.P. Burte, Microelectron. J. 24 (1993) 421.
- (1993) Microelectron. J. , vol.24 , pp. 421
- Rausch, N.¹ Burte, E.P.²

5
- 84984148205
- H. Treichel, A. Mitwalsky, G. Tempel, G. Zorn, D.A. Bohling, K.R. Coyle, B.S. Felker, M. George, W. Kern, A.P. Lane, N.P. Sandler, Adv. Mater. Optics Electron. 5 (1995) 163.
- (1995) Adv. Mater. Optics Electron. , vol.5 , pp. 163
- Treichel, H.¹ Mitwalsky, A.² Tempel, G.³ Zorn, G.⁴ Bohling, D.A.⁵ Coyle, K.R.⁶ Felker, B.S.⁷ George, M.⁸ Kern, W.⁹ Lane, A.P.¹⁰ Sandler, N.P.¹¹

6
- 0026867932
- K. Tominaga, Jpn. J. Appl. Phys. 31 (1992) L585.
- (1992) Jpn. J. Appl. Phys. , vol.31
- Tominaga, K.¹

7
- 4243543579
- Y. Numasawa, S. Kamiyama, M. Zenke, M. Sakamoto, IEDM (1989) 43.
- (1989) IEDM , pp. 43
- Numasawa, Y.¹ Kamiyama, S.² Zenke, M.³ Sakamoto, M.⁴

8
- 4243674188
- S.C. Sun, T.F. Chen, IEDM (1996) 687.
- (1996) IEDM , pp. 687
- Sun, S.C.¹ Chen, T.F.²

9
- 0025486032
- S. Zaima, T. Furuta, Y. Koide, Y. Yasuda, J. Electrochem. Soc. 137 (1990) 2876.
- (1990) J. Electrochem. Soc. , vol.137 , pp. 2876
- Zaima, S.¹ Furuta, T.² Koide, Y.³ Yasuda, Y.⁴

10
- 0026122756
- H. Shinriki, M. Nakata, IEEE Trans. Electron Devices 38 (1991) 455.
- (1991) IEEE Trans. Electron Devices , vol.38 , pp. 455
- Shinriki, H.¹ Nakata, M.²

11
- 0028386001
- C.H. An, K. Sugimoto, J. Electrochem. Soc. 141 (1994) 853.
- (1994) J. Electrochem. Soc. , vol.141 , pp. 853
- An, C.H.¹ Sugimoto, K.²

12
- 0001262783
- E.P. Burte, N. Rausch, J. Non-Cryst. Solids 187 (1995) 425.
- (1995) J. Non-Cryst. Solids , vol.187 , pp. 425
- Burte, E.P.¹ Rausch, N.²

13
- 0000291382
- R.A.B. Devine, Appl. Phys. Lett. 68 (1996) 1924.
- (1996) Appl. Phys. Lett. , vol.68 , pp. 1924
- Devine, R.A.B.¹

14
- 0028436585
- S. Kamiyama, H. Suzuki, H. Watanabe, A. Sakai, H. Kimura, J. Mizuki, J. Electrochem. Soc. 141 (1994) 1246.
- (1994) J. Electrochem. Soc. , vol.141 , pp. 1246
- Kamiyama, S.¹ Suzuki, H.² Watanabe, H.³ Sakai, A.⁴ Kimura, H.⁵ Mizuki, J.⁶

15
- 85046428965
- Z. Mingfei, F. Zhengwen, Y. Haijun, Z. Zhuangjian, Q. Qizong, Appl. Suf. Sci. 108 (1997) 399.
- (1997) Appl. Suf. Sci. , vol.108 , pp. 399
- Mingfei, Z.¹ Zhengwen, F.² Haijun, Y.³ Zhuangjian, Z.⁴ Qizong, Q.⁵

16
- 0028423997
- A. Muto, F. Yano, Y. Sugawara, S. lijima, Jpn. J. Appl. Phys. 33 (1994) 2699.
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 2699
- Muto, A.¹ Yano, F.² Sugawara, Y.³ Lijima, S.⁴

17
- 84987380386
- P.C. Fazan, V.K. Mathews, N. Sandler, G.Q. Lo, D.L. Kwong, IEDM (1992) 263.
- (1992) IEDM , pp. 263
- Fazan, P.C.¹ Mathews, V.K.² Sandler, N.³ Lo, G.Q.⁴ Kwong, D.L.⁵

18
- 0029403356
- I. Kim, J. Kim, B. Cho, S. Ahn, J.S. Chun, W. Lee, J. Mater. Res. 10 (1995) 2864.
- (1995) J. Mater. Res. , vol.10 , pp. 2864
- Kim, I.¹ Kim, J.² Cho, B.³ Ahn, S.⁴ Chun, J.S.⁵ Lee, W.⁶

19
- 0012491919
- S. Banerjee, B. Shen, I. Chen, J. Bohlman, G. Brown, Doering, J. Appl. Phys. 65 (1989) 1140.
- (1989) J. Appl. Phys. , vol.65 , pp. 1140
- Banerjee, S.¹ Shen, B.² Chen, I.³ Bohlman, J.⁴ Brown, G.⁵ Doering⁶

20
- 84975407383
- W. Kern, A. Chen, N. Sandler, J. Phys. (Paris) IV 1 (1991) 311.
- (1991) J. Phys. (Paris) IV , vol.1 , pp. 311
- Kern, W.¹ Chen, A.² Sandler, N.³

21
- 0030397789
- K.A. Mckinley, N.P. Sandler, Thin Solid Films 290-291 (1996) 440.
- (1996) Thin Solid Films , vol.290-291 , pp. 440
- Mckinley, K.A.¹ Sandler, N.P.²

22
- 0031070413
- W.S. Lau, P.W. Qian, N.P. Sandler, K.A. Mckinley, P.K. Chu, Jpn. J. Appl. Phys. 36 (1997) 661.
- (1997) Jpn. J. Appl. Phys. , vol.36 , pp. 661
- Lau, W.S.¹ Qian, P.W.² Sandler, N.P.³ Mckinley, K.A.⁴ Chu, P.K.⁵

23
- 0026883406
- S.W. Park, Y.K. Baek, J.Y. Lee, C.O. Park, H.B. Im, J. Electron. Mater. 21 (1992) 635.
- (1992) J. Electron. Mater. , vol.21 , pp. 635
- Park, S.W.¹ Baek, Y.K.² Lee, J.Y.³ Park, C.O.⁴ Im, H.B.⁵

24
- 0027274523
- H. Treichel, A. Mitwalsky, G. Tempel, G. Zorn, W. Kern, N. Sandler, A.P. Lane, Mater. Res. Soc. Symp. Proc. 282 (1993) 557.
- (1993) Mater. Res. Soc. Symp. Proc. , vol.282 , pp. 557
- Treichel, H.¹ Mitwalsky, A.² Tempel, G.³ Zorn, G.⁴ Kern, W.⁵ Sandler, N.⁶ Lane, A.P.⁷

25
- 0027609883
- S. Kamiyama, P. Lesaicherre, H. Suzuki, A. Sakai, I. Nishiyama, A. Ishitani, J. Electrochem. Soc. 140 (1993) 1617.
- (1993) J. Electrochem. Soc. , vol.140 , pp. 1617
- Kamiyama, S.¹ Lesaicherre, P.² Suzuki, H.³ Sakai, A.⁴ Nishiyama, I.⁵ Ishitani, A.⁶

26
- 36449002425
- H. Kimura, J. Mizuki, S. Kamiyama, H. Suzuki, Appl. Phys. Lett. 66 (1995) 2209.
- (1995) Appl. Phys. Lett. , vol.66 , pp. 2209
- Kimura, H.¹ Mizuki, J.² Kamiyama, S.³ Suzuki, H.⁴

27
- 85031616864
- W.S. Lau, T.S. Tan, N.P. Sandler, B.S. Page, Jpn. J. Appl. Phys. 34 (1995) 757.
- (1995) Jpn. J. Appl. Phys. , vol.34 , pp. 757
- Lau, W.S.¹ Tan, T.S.² Sandler, N.P.³ Page, B.S.⁴

28
- 0026908550
- Z. Liu, H. Wann, P.K. Ko, C. Hu, Y. Cheng, IEEE Electron Devices Lett. 13 (1992) 402.
- (1992) IEEE Electron Devices Lett. , vol.13 , pp. 402
- Liu, Z.¹ Wann, H.² Ko, P.K.³ Hu, C.⁴ Cheng, Y.⁵

29
- 85031632077
- submitted
- A.Y. Mao, K-A. Son, J.M. White, D.L. Kwong, D.A. Roberts, R.N. Vrtis, J. Vac. Sci. Technol. (submitted).
- J. Vac. Sci. Technol.
- Mao, A.Y.¹ Son, K.-A.² White, J.M.³ Kwong, D.L.⁴ Roberts, D.A.⁵ Vrtis, R.N.⁶

30
- 0000729499
- K-A. Son, A.Y. Mao, B.Y. Kim, F. Liu, E.D. Pylant, D.A. Hess, J.M. White, D-L. Kwong, D. Roberts, R. Vrtis, J. Vac. Sci. Technol. A 16 (1998) 1670.
- (1998) J. Vac. Sci. Technol. A , vol.16 , pp. 1670
- Son, K.-A.¹ Mao, A.Y.² Kim, B.Y.³ Liu, F.⁴ Pylant, E.D.⁵ Hess, D.A.⁶ White, J.M.⁷ Kwong, D.-L.⁸ Roberts, D.⁹ Vrtis, R.¹⁰

31
- 0001066730
- K-A. Son, A.Y. Mao, Y-M. Sun, B.Y. Kim, F. Liu, A. Kamath, J.M. White, D.L. Kwong, D.A. Roberts, R.N. Vrtis, Appl. Phys. Lett. 72 (1998) 1187.
- (1998) Appl. Phys. Lett. , vol.72 , pp. 1187
- Son, K.-A.¹ Mao, A.Y.² Sun, Y.-M.³ Kim, B.Y.⁴ Liu, F.⁵ Kamath, A.⁶ White, J.M.⁷ Kwong, D.L.⁸ Roberts, D.A.⁹ Vrtis, R.N.¹⁰

32
- 85031626794
- Ph.D. Dissertation, University of Texas at Austin
- A. Kamath, Ph.D. Dissertation, University of Texas at Austin, 1997.
- (1997)
- Kamath, A.¹

33
- 0003459529
- Physical Electronics, Inc., Eden Prairie, MN
- J.F. Moulder, W.F. Stickle, P.E. Sobol, K.D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, Physical Electronics, Inc., Eden Prairie, MN, 1995.
- (1995) Handbook of X-ray Photoelectron Spectroscopy
- Moulder, J.F.¹ Stickle, W.F.² Sobol, P.E.³ Bomben, K.D.⁴

34
- 0030655245
- A. Kamath, B.Y. Kim, P.M. Blass, Y-M. Sun, J.M. White, D-L. Kwong, Mater. Res. Soc. Symp. Proc. 477 (1997) 335.
- (1997) Mater. Res. Soc. Symp. Proc. , vol.477 , pp. 335
- Kamath, A.¹ Kim, B.Y.² Blass, P.M.³ Sun, Y.-M.⁴ White, J.M.⁵ Kwong, D.-L.⁶

35
- 0004554161
- E. Briner, C. Meiner, A. Rothen, J. Chem. Phys. 23 (1926) 609.
- (1926) J. Chem. Phys. , vol.23 , pp. 609
- Briner, E.¹ Meiner, C.² Rothen, A.³

36
- 36449007588
- P.T. Tobin, Y. Okada, S.A. Ajuria, V. Lakhobitta, W.A. Feil, R.I. Hedge, J. Appl. Phys. 75 (1994) 1811.
- (1994) J. Appl. Phys. , vol.75 , pp. 1811
- Tobin, P.T.¹ Okada, Y.² Ajuria, S.A.³ Lakhobitta, V.⁴ Feil, W.A.⁵ Hedge, R.I.⁶

37
- 33646315084
- in press
- K-A. Son, A.Y. Mao, D.A. Hess, L.A. Brown, J.M. White, D.L. Kwong, D.A. Roberts, R.N. Vrtis, J. Electrochem. Soc. (1998) in press.
- (1998) J. Electrochem. Soc.
- Son, K.-A.¹ Mao, A.Y.² Hess, D.A.³ Brown, L.A.⁴ White, J.M.⁵ Kwong, D.L.⁶ Roberts, D.A.⁷ Vrtis, R.N.⁸

38
- 0025447345
- Y. Kobayashi, Y. Shinoda, K. Sugil, Jpn. J. Appl. Phys. 29 (1990) 1004.
- (1990) Jpn. J. Appl. Phys. , vol.29 , pp. 1004
- Kobayashi, Y.¹ Shinoda, Y.² Sugil, K.³

39
- 21144463419
- Y-K. Sun, D.J. Bonser, T. Engel, J. Vac. Sci. Technol. A 10 (1992) 2314.
- (1992) J. Vac. Sci. Technol. A , vol.10 , pp. 2314
- Sun, Y.-K.¹ Bonser, D.J.² Engel, T.³

40
- 0031548154
- Y. Takakuwa, M. Nihei, N. Miyamato, Appl. Surf. Sci. 117-118 (1997) 141.
- (1997) Appl. Surf. Sci. , vol.117-118 , pp. 141
- Takakuwa, Y.¹ Nihei, M.² Miyamato, N.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.