Focused ion beams in microsystem fabrication

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 431-434

  Daniel, J H ^a   Moore, D F ^a   Walkerb, J F ^b   Whitney, J T ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Fei europe   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; ION BEAMS; OXIDATION; SILICON ON INSULATOR TECHNOLOGY;

ANISOTROPIC WET ETCHING; FOCUSED ION BEAM; MICROELECTROMECHANICAL MECHANICAL SYSTEM;

MICROELECTRONICS;

EID: 0031069434     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00128-1     Document Type: Article

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