Atomic force microscopy investigation of the effects of annealing on amorphous carbon nitride films deposited by r.f. magnetron sputtering

Diamond and Related Materials

Volumn 8, Issue 6, 1999, Pages 993-995

  Prioli, R ^a   Zanette, S I ^a   Caride, A O ^a   Lacerda, M M ^b   Freire Jr , F L ^b  

^a CENTRO BRASILEIRO DE PESQUISAS FÍSICAS   (Brazil)

^b PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

Author keywords

Annealing; Atomic force microscopy; Carbon nitride; Tribology

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; FILM PREPARATION; FRICTION; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; SILICON NITRIDE; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THERMAL EFFECTS; TRIBOLOGY;

CARBON NITRIDE;

AMORPHOUS FILMS;

EID: 0032630407     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00453-1     Document Type: Article

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