Control of photoresist properties: A Kalman filter based approach

IEEE Transactions on Semiconductor Manufacturing

Volumn 9, Issue 2, 1996, Pages 208-214

  Palmer, Evan ^b   Ren, Wei ^b   Spanos, Costas J ^a,b   Poolla, Kameshwar ^b  

^a IEEE

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; COATING TECHNIQUES; FEEDBACK; FEEDBACK CONTROL; KALMAN FILTERING; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; PROCESS CONTROL; RECURSIVE FUNCTIONS; SEMICONDUCTOR DEVICE MANUFACTURE; SENSORS;

INTEGRATED ELECTRONICS; PHOTORESIST PARAMETERS; PROCESS DRIFT; SPIN COATING PROCESS; STATIC PROCESS MODEL;

PHOTORESISTS;

EID: 0030150976     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.492814     Document Type: Article

References (13)

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