Dynamic neural control for a plasma etch process

IEEE Transactions on Neural Networks

Volumn 8, Issue 4, 1997, Pages 883-901

  Card, Jill P ^a,d   Sniderman, Debbie L ^b   Klimasauskas, Casimir ^c  

^a HEWLETT PACKARD COMPANY   (United States)

^b ANALOG DEVICES INC   (United States)

^c NeuralWare Inc   (United States)

^d IEEE   (United States)

Author keywords

Cascade correlation; Control; Dynamic control optimization; Neural network; Plasma etch; Process control; Semiconductor manufacturing; Sensitivity

Indexed keywords

ALGORITHMS; CASCADE CONTROL SYSTEMS; COST EFFECTIVENESS; ITERATIVE METHODS; NEURAL NETWORKS; OPTIMIZATION; SEMICONDUCTOR DEVICE MANUFACTURE;

DYNAMIC NEURAL CONTROL;

PLASMA ETCHING;

EID: 0031185548     PISSN: 10459227     EISSN: None     Source Type: Journal    
DOI: 10.1109/72.595886     Document Type: Article

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