Semi-empirical neural network modeling of metal-organic chemical vapor deposition

IEEE Transactions on Semiconductor Manufacturing

Volumn 10, Issue 2, 1997, Pages 288-294

  Nami, Ziba ^a,b   Misman, Ozgur ^b   Erbil, Ahmet ^b   May, Gary S ^a,c  

^a IEEE   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACKPROPAGATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NEURAL NETWORKS; PRESSURE EFFECTS; PROCESS CONTROL; SEMICONDUCTOR DEVICE MODELS; THERMAL EFFECTS; THIN FILMS; TITANIUM DIOXIDE;

SEMIEMPIRICAL NEURAL PROCESS MODELS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031146079     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.572084     Document Type: Article

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