Optimal control for increasing throughput in low pressure chemical vapor deposition

Proceedings of the IEEE Conference on Decision and Control

Volumn 4, Issue , 1996, Pages 4831-4836

  Song, Lijuan ^a   Shen, Sisan ^a   Tsakalis, Kostas S ^a   Crouch, Peter E ^a   Cale, Timothy S ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADAPTIVE ALGORITHMS; CHEMICAL VAPOR DEPOSITION; INVERSE PROBLEMS; OPTIMIZATION; PRESSURE EFFECTS; PROCESS CONTROL; TEMPERATURE CONTROL;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); ONE DIMENSIONAL KNUDSEN DIFFUSION;

OPTIMAL CONTROL SYSTEMS;

EID: 0030416739     PISSN: 01912216     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Review

References (23)