A framework for robust run by run control with lot delayed measurements

IEEE Transactions on Semiconductor Manufacturing

Volumn 10, Issue 1, 1997, Pages 75-83

  Baras, John S ^a,b   Patel, Nital S ^a,b  

^a IEEE   (United States)

^b UNIVERSITY OF MARYLAND   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; CLOSED LOOP CONTROL SYSTEMS; CONTROL NONLINEARITIES; CONTROL SYSTEM SYNTHESIS; CONTROL THEORY; OPTIMIZATION; PROCESS CONTROL; ROBUSTNESS (CONTROL SYSTEMS); STATISTICAL PROCESS CONTROL;

LOT DELAYED MEASUREMENTS; NOISE BOUNDS; RUN BY RUN CONTROL PROBLEM; SEMICONDUCTOR INDUSTRY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031078819     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.554488     Document Type: Article

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