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Volumn 38, Issue 9, 1998, Pages 1471-1483

Sub-quarter micron silicon integrated circuits and single wafer processing

(1)  Singh, R a  


Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; LEAKAGE CURRENTS; LITHOGRAPHY; MICROELECTRONIC PROCESSING; OPTIMIZATION; RELIABILITY; SILICON WAFERS; THERMAL STRESS;

EID: 0032156785     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(98)00052-3     Document Type: Article
Times cited : (1)

References (26)
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    • (1993) IEDM Tech Dig , pp. 119-122
    • Ono, M.1    Saito, M.2    Yoshitomi, T.3    Fiegnu, C.4    Ohguro, T.5    Iwai, H.6
  • 3
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    • (1986) Mat Res Soc , vol.71 , pp. 519-524
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    • Review of conductor-insulator-semiconductor solar cells
    • Singh R, Green MA, Rajkanan K. Review of conductor-insulator-semiconductor solar cells. Sol Cells 1981;3:95-148.
    • (1981) Sol Cells , vol.3 , pp. 95-148
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    • The effect of subtractive defects and grain size on VLSI interconnect early failures
    • Menon SS, Poole KF. The effect of subtractive defects and grain size on VLSI interconnect early failures. Thin Solid Films 1992;220:24-9.
    • (1992) Thin Solid Films , vol.220 , pp. 24-29
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    • (1986) Semicond Intl , vol.9 , Issue.1 , pp. 28-29
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    • (1988) J Appl Phys , vol.63
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    • (1997) Solid State Tech. , vol.40 , Issue.10 , pp. 193-198
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    • (1997) J Electron Mat , vol.26 , pp. 1184-1188
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    • Rapid photothermal processing assisted metalorganic chemical vapor deposition of barium strontium titanate
    • in review
    • Chen Y, Singh R. Rapid photothermal processing assisted metalorganic chemical vapor deposition of barium strontium titanate. J Electrochem Soc (in review).
    • J Electrochem Soc
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    • Deposition of high dielectric constant materials by dual spectral sources assisted metalorganic chemical vapor deposition
    • Singh R, Alamgir S, Sharangpani R. Deposition of high dielectric constant materials by dual spectral sources assisted metalorganic chemical vapor deposition. Appl Phys Lett 1995;67:3939.
    • (1995) Appl Phys Lett , vol.67 , pp. 3939
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  • 19
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    • Low temperature shallow junction formation using vacuum ultraviolet photons during rapid thermal processing
    • Singh R, Cherukuri KC, Vedula L, Rohatgi A, Narayanan S. Low temperature shallow junction formation using vacuum ultraviolet photons during rapid thermal processing. Appl Phys Lett 1997;70:1700-2.
    • (1997) Appl Phys Lett , vol.70 , pp. 1700-1702
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  • 20
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    • A computerized direct liquid injection based rapid isothermal processing assisted chemical vapor deposition system for Teflon amorphous fluoropolymer
    • Sharangpani R, Singh R. A computerized direct liquid injection based rapid isothermal processing assisted chemical vapor deposition system for Teflon amorphous fluoropolymer. Rev Scient Instr 1997;68:1564-70.
    • (1997) Rev Scient Instr , vol.68 , pp. 1564-1570
    • Sharangpani, R.1    Singh, R.2
  • 21
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    • Chemical vapor deposition and characterization of Teflon amorphous fluoropolymer thin films
    • Sharangpani R, Singh R, Drews M, Ivey K. Chemical vapor deposition and characterization of Teflon amorphous fluoropolymer thin films. J Electron Mat 1997;26:402-9.
    • (1997) J Electron Mat , vol.26 , pp. 402-409
    • Sharangpani, R.1    Singh, R.2    Drews, M.3    Ivey, K.4
  • 22
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    • Hollaway P, McGuire G, editors. Park Ridge, NJ: Noyce Publications
    • Singh R. Handbook of compound semiconductors. Hollaway P, McGuire G, editors. Park Ridge, NJ: Noyce Publications, 1995:442-517.
    • (1995) Handbook of Compound Semiconductors , pp. 442-517
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  • 23
    • 0032026142 scopus 로고    scopus 로고
    • Low temperature copper using an inductively coupled plasma with ultraviolet light irradiation
    • Choi KS, Han CH. Low temperature copper using an inductively coupled plasma with ultraviolet light irradiation. J Electrochem Soc 1998;145:L37-9.
    • (1998) J Electrochem Soc , vol.145
    • Choi, K.S.1    Han, C.H.2
  • 26
    • 3843063326 scopus 로고    scopus 로고
    • Role of rapid photothermal processing in environmentally conscious semiconductor manufacturing
    • Sharangpani R, Singh R. Role of rapid photothermal processing in environmentally conscious semiconductor manufacturing. J Mat Res 1998;12:61-7.
    • (1998) J Mat Res , vol.12 , pp. 61-67
    • Sharangpani, R.1    Singh, R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.