Low temperature shallow junction formation using vacuum ultraviolet photons during rapid thermal processing

Applied Physics Letters

Volumn 70, Issue 13, 1997, Pages 1700-1702

  Singh, R ^a   Cherukuri, K C ^a   Vedula, L ^a   Rohatgi, A ^b   Narayanan, S ^c  

^a AMRL   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^c Solarex Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005891131     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118674     Document Type: Article

References (17)

1. R. Singh, J. Appl. Phys. 63, R59 (1988).
2. R. Singh, Semicond. Int. 9, 28 (1986).
3. R. Singh, F. Radpour, and P. Chou, J. Vac. Sci. Technol. A 7, 1456 (1989).
4. R. Singh, P. Chou, F. Radpour, A. J. Nelson, and H. S. Ullal, J. Appl. Phys. 66, 2381 (1989).
5. R. Singh, S. Sinha, R. P. S. Thakur, and P. Chou, Appl. Phys. Lett. 58, 1217 (1991).
6. R. Singh, Proceedings of the International Conference on Beam Processing of Advanced Materials, edited by J. Singh and S. M. Copley (The Minerals, Metals & Materials Society, Warrendale, PA, 1993), p. 619.
7. J. Mavoori, R. Singh, S. Narayanan, and J. Chaudhuri, Appl. Phys. Lett. 65, 1935 (1994).
8. R. Singh and R. P. S. Thakur, Electrochem. Soc. Interface 4, 28 (1995).
9. R. Singh, in Handbook of Compound Semiconductors, edited by P. H. Holloway and G. E. Mc Guire (Noyes, New Jersey, 1995), Chap. 9, p. 442.
10. E. Yablonovitch, D. L. Allara, C. C. Chang, T. Gmitter, and T. B. Bright, Phys. Rev. Lett. 57, 249 (1986).
11. P. J. Timans, J. Appl. Phys. 74, 6353 (1993).
12. R. Singh, R. Sharangpani, K. C. Cherukuri, Y. Chen, D. M. Dawson, K. F. Poole, A. Rohatgi, S. Narayanan, and R. P. S. Thakur, Mater. Res. Soc. Symp. Proc. 429, 81 (1996).
13. K. N. Tu, J. W. Mayer, and L. C. Feldman, Electronic Thin Film Science for Electrical Engineers and Material Scientists (Macmillan, New York, 1992), p. 46.
14. P. Suppan, Principles of Photochemistry (Chemical Society, London, 1973), p. 6.
15. T. Yamazaki, S. Watanabe, and T. Ito, J. Electrochem. Soc. 137, 313 (1990).
16. D. Mathiot and D. Barbier, J. Appl. Phys. 69, 3878 (1991).
17. B. Hartiti, J. C. Muller, and P. Siffert, IEEE Trans. Electron Devices 39, 96 (1992).