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Volumn 41, Issue 2, 1998, Pages 424-428

Pulsing a low pressure radiofrequency discharge

Author keywords

Plasma breakdown; Pulsed RF discharge; Simulation

Indexed keywords

COMPUTER SIMULATION; ELECTRIC BREAKDOWN; PHYSICS; PLASMAS;

EID: 0032072268     PISSN: 13408054     EISSN: None     Source Type: Journal    
DOI: 10.1299/jsmeb.41.424     Document Type: Article
Times cited : (2)

References (12)
  • 2
    • 0000518110 scopus 로고    scopus 로고
    • Pulsed High Rate Plasma Etching with Variable Si/SiOz Selectivity and Variable Si Etch Profiles
    • Boswell, R.W. and Henry, D., Pulsed High Rate Plasma Etching with Variable Si/SiOz Selectivity and Variable Si Etch Profiles, Appl. Phys. Lett., Vol. 47 (1985) p. 1095.
    • Appl. Phys. Lett., Vol. 47 (1985) P. 1095.
    • Boswell, R.W.1    Henry, D.2
  • 6
    • 36149031433 scopus 로고    scopus 로고
    • Measurement of the Electric Charge on Particulates Forming Coulomb Crystals in the Sheath of a Radiofrequency Discharge
    • Trottenberg, Th., Melzer, A. and Piel, A., Measurement of the Electric Charge on Particulates Forming Coulomb Crystals in the Sheath of a Radiofrequency Discharge, Plasma Sources Sei. Technol. Vol. A 64 (1995) p. 450.
    • Plasma Sources Sei. Technol. Vol. A 64 (1995) P. 450.
    • Trottenberg, T.1    Melzer, A.2    Piel, A.3
  • 7
    • 0030133965 scopus 로고    scopus 로고
    • Pulse-Time Modulated Plasma Discharge for Highly Selective, Highly Anisotropie and Charge-Free Etching, Plasma Sources Sei
    • Samukawa, S. and Mieno, T., Pulse-Time Modulated Plasma Discharge for Highly Selective, Highly Anisotropie and Charge-Free Etching, Plasma Sources Sei. Technol. Vol. 5 (1996) p. 132.
    • Technol. Vol. 5 (1996) P. 132.
    • Samukawa, S.1    Mieno, T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.