Pulsed high rate plasma etching with variable Si/SiO2 selectivity and variable Si etch profiles

Applied Physics Letters

Volumn 47, Issue 10, 1985, Pages 1095-1097

  Boswell, R W ^a   Henry, D ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

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Indexed keywords

EID: 0000518110     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.96340     Document Type: Article

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