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Volumn 4, Issue 3, 1998, Pages 498-503

Characteristics of InGaN-AlGaN multiple-quantum-well laser diodes

(10)  Bour, David P a,b,c,d,e   Kneissl, Michael a,b,f,g   Romano, Linda T b,h,i,j,k   McCluskey, Matthew D b,c,g   Van De Walle, Chris G b,l,m,n,o,p,q   Krusor, Brent S b   Donaldson, Rose M b   Walker, Jack b   Dunnrowicz, Clarence J b   Johnson, Noble M a,b  


Author keywords

CVD; Nitrogen compounds; Quantum well lasers; Semiconductor epitaxial layers; Semiconductor heterojunctions; Semiconductor lasers; Semiconductor materials

Indexed keywords

CURRENT DENSITY; ETCHING; HETEROJUNCTIONS; ION BEAMS; LASER MODES; LIGHT EMISSION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SAPPHIRE; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR GROWTH; VAPOR PHASE EPITAXY;

EID: 0032064462     PISSN: 1077260X     EISSN: None     Source Type: Journal    
DOI: 10.1109/2944.704108     Document Type: Article
Times cited : (19)

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