-
1
-
-
0024752681
-
-
"GaAIAs/GaAs heterojunction bipolar transistors: Issues and prospects for application," vol. 36, pp. 2032-2042, 1989.
-
P. M. Asbeck, M. F. Chang, J. A. Higgins, N. H. Sheng, G. J. Sullivan, and K. Wang, "GaAIAs/GaAs heterojunction bipolar transistors: Issues and prospects for application," IEEE Trans. Electron Devices, vol. 36, pp. 2032-2042, 1989.
-
IEEE Trans. Electron Devices
-
-
Asbeck, P.M.1
Chang, M.F.2
Higgins, J.A.3
Sheng, N.H.4
Sullivan, G.J.5
Wang, K.6
-
2
-
-
0025577022
-
-
"Current induced degradation of Be-doped AlGaAs/GaAs HBT's and its suppression by Zn diffusion into extrinsic base layer," in 1990 IEDM Tech. Dig., San Francisco, CA, 1990, pp. 673-676.
-
O. Nakajima, H. Ito, T. Nittono, and K. Nagata, "Current induced degradation of Be-doped AlGaAs/GaAs HBT's and its suppression by Zn diffusion into extrinsic base layer," in Proc. 1990 IEDM Tech. Dig., San Francisco, CA, 1990, pp. 673-676.
-
Proc.
-
-
Nakajima, O.1
Ito, H.2
Nittono, T.3
Nagata, K.4
-
3
-
-
0027625334
-
-
"Characterization of current-induced degradation in Be-doped HBT's based in GaAs and InP," 40, pp. 1194-1201, 1993.
-
S. Tanaka, H. Shimawaki, K. Kasahara, and K. Honjo, "Characterization of current-induced degradation in Be-doped HBT's based in GaAs and InP," IEEE Trans. Electron Devices, vol. ED-40, pp. 1194-1201, 1993.
-
IEEE Trans. Electron Devices, Vol. ED
-
-
Tanaka, S.1
Shimawaki, H.2
Kasahara, K.3
Honjo, K.4
-
4
-
-
0026822844
-
-
"Stress effect on current-induced degradation of Be-doped AlGaAs/GaAs heterojunction bipolar transistors," vol. 31, pp. 751-756, 1992.
-
K. Mochizuki, S. Isomae, H. Masuda, T. Tanoue, and C. Kusano, "Stress effect on current-induced degradation of Be-doped AlGaAs/GaAs heterojunction bipolar transistors," Jpn. J. Appl. Phys., vol. 31, pp. 751-756, 1992.
-
Jpn. J. Appl. Phys.
-
-
Mochizuki, K.1
Isomae, S.2
Masuda, H.3
Tanoue, T.4
Kusano, C.5
-
5
-
-
36449002570
-
-
"Stability of carbon and beryllium-doped base GaAs/AlGaAs heterojunction bipolar transistors," vol. 59, pp. 3613-3615, 1991.
-
F. Ren, T. R. Fullowan, J. Lothian, P. W. Wisk, C. R. Abernathy, R. F. Kopf, A. B. Emerson, S. W. Downey, and S. J. Pearton, "Stability of carbon and beryllium-doped base GaAs/AlGaAs heterojunction bipolar transistors," Appl. Phys. Lett., vol. 59, pp. 3613-3615, 1991.
-
Appl. Phys. Lett.
-
-
Ren, F.1
Fullowan, T.R.2
Lothian, J.3
Wisk, P.W.4
Abernathy, C.R.5
Kopf, R.F.6
Emerson, A.B.7
Downey, S.W.8
Pearton, S.J.9
-
6
-
-
36449003597
-
-
"Recombination-enhanced impurity diffusion in Be-doped GaAs," vol. 58, pp. 2015-2017, 1991.
-
M. Uematsu and K. Wada, "Recombination-enhanced impurity diffusion in Be-doped GaAs," Appl. Phys. Lett., vol. 58, pp. 2015-2017, 1991.
-
Appl. Phys. Lett.
-
-
Uematsu, M.1
Wada, K.2
-
7
-
-
0026900559
-
-
"Current-induced degradation of AlGaAs/GaAs heterojunction bipolar transistors and its suppression by thermal annealing in As overpressure," vol. 31, pp. 2343-2348, 1992.
-
O. Nakajima, H. Ito, T. Nittono, and K. Nagata, "Current-induced degradation of AlGaAs/GaAs heterojunction bipolar transistors and its suppression by thermal annealing in As overpressure," Jpn. J. Appl. Phys., vol. 31, pp. 2343-2348, 1992.
-
Jpn. J. Appl. Phys.
-
-
Nakajima, O.1
Ito, H.2
Nittono, T.3
Nagata, K.4
-
8
-
-
0026168877
-
-
"High-performance MOCVD-grown AlGaAs/GaAs heterojunction bipolar transistors with carbon-doped base," vol. 12, pp. 347-349, 1991.
-
G. W. Wang, R. L. Pierson, P. M. Asbeck, K. Wang, N. Wang, R. Nubling, M. F. Chang, J. Salerno, and S. Sastry, "High-performance MOCVD-grown AlGaAs/GaAs heterojunction bipolar transistors with carbon-doped base," IEEE Electron Device Lett., vol. 12, pp. 347-349, 1991.
-
IEEE Electron Device Lett.
-
-
Wang, G.W.1
Pierson, R.L.2
Asbeck, P.M.3
Wang, K.4
Wang, N.5
Nubling, R.6
Chang, M.F.7
Salerno, J.8
Sastry, S.9
-
9
-
-
0028728470
-
-
"Current gain deterioration in carbondoped AlGaAs/GaAs heterojunction bipolar transistors during hightemperature bias stress tests," 28, pp. 257-260, 1994.
-
T. Ishibashi, H. Sugahara, H. Ito, T. Nittono, K. Nagata, O. Nakajima, J. Nagano, and K. Ogawa, "Current gain deterioration in carbondoped AlGaAs/GaAs heterojunction bipolar transistors during hightemperature bias stress tests," Mater. Sci. Eng., vol. B28, pp. 257-260, 1994.
-
Mater. Sci. Eng., Vol. B
-
-
Ishibashi, T.1
Sugahara, H.2
Ito, H.3
Nittono, T.4
Nagata, K.5
Nakajima, O.6
Nagano, J.7
Ogawa, K.8
-
10
-
-
36449008447
-
-
"Passivation of carbon-doped GaAs layers by hydrogen introduced by annealing and growth ambients," vol. 73, pp. 3716-3724, 1993.
-
D. M. Kozuch, M. Stavola, S. J. Pearton, C. R. Abernathy, and W. S. Hobson, "Passivation of carbon-doped GaAs layers by hydrogen introduced by annealing and growth ambients," J. Appl. Phys., vol. 73, pp. 3716-3724, 1993.
-
J. Appl. Phys.
-
-
Kozuch, D.M.1
Stavola, M.2
Pearton, S.J.3
Abernathy, C.R.4
Hobson, W.S.5
-
11
-
-
0012674559
-
-
"Hydrogen in carbon-doped GaAs grown by metalorganic molecular beam epitaxy," vol. 57, pp. 2561-2563, 1990.
-
D. M. Kozuch, M. Stavola, S. J. Pearton, C. R. Abernathy, and J. Lopata, "Hydrogen in carbon-doped GaAs grown by metalorganic molecular beam epitaxy," Appl. Phys. Lett., vol. 57, pp. 2561-2563, 1990.
-
Appl. Phys. Lett.
-
-
Kozuch, D.M.1
Stavola, M.2
Pearton, S.J.3
Abernathy, C.R.4
Lopata, J.5
-
12
-
-
0010320654
-
-
"Evidence for complexes of hydrogen with deep-level defects in bulk III-V materials," vol. 58, pp. 1755-1757, 1987.
-
B. Clerjaud, D. Cote, and C. Naud, "Evidence for complexes of hydrogen with deep-level defects in bulk III-V materials," Phys. Rev. Lett., vol. 58, pp. 1755-1757, 1987.
-
Phys. Rev. Lett.
-
-
Clerjaud, B.1
Cote, D.2
Naud, C.3
-
13
-
-
21544448650
-
-
"Thermal stability of dopant-hydrogen pairs in GaAs," vol. 59, pp. 3571-3573, 1991.
-
S. J. Pearton, C. R. Abernathy, and J. Lopata, "Thermal stability of dopant-hydrogen pairs in GaAs," Appl. Phys. Lett., vol. 59, pp. 3571-3573, 1991.
-
Appl. Phys. Lett.
-
-
Pearton, S.J.1
Abernathy, C.R.2
Lopata, J.3
-
14
-
-
0029546295
-
-
"Hydrogen induced degradation in heavily carbon-doped GaAs diodes," 196-201, pp. 957-962, 1995.
-
H. Fushimi and K. Wada, "Hydrogen induced degradation in heavily carbon-doped GaAs diodes," Mater. Sci. Forum., vols. 196-201, pp. 957-962, 1995.
-
Mater. Sci. Forum., Vols.
-
-
Fushimi, H.1
Wada, K.2
-
15
-
-
0001439695
-
-
"Annealing effect on the electrical properties of heavily C-doped p+GaAs," vol. 59, pp. 434-436, 1992.
-
K. Watanabe and H. Yamazaki, "Annealing effect on the electrical properties of heavily C-doped p+GaAs," Appl. Phys. Lett., vol. 59, pp. 434-436, 1992.
-
Appl. Phys. Lett.
-
-
Watanabe, K.1
Yamazaki, H.2
-
16
-
-
0028761918
-
-
"The presence of isolated hydrogen donors in heavily carbon-doped GaAs," vol. 145, pp. 420-426, 1994.
-
H. Fushimi and K. Wada, "The presence of isolated hydrogen donors in heavily carbon-doped GaAs," J. Cryst. Growth, vol. 145, pp. 420-426, 1994.
-
J. Cryst. Growth
-
-
Fushimi, H.1
Wada, K.2
-
17
-
-
18144432984
-
-
"Interstitial hydrogen and the dissociation of C-H defects in GaAs," 196-201, pp. 951-956, 1995.
-
S. J. Breuer, R. Jones, S. Öberg, and P. R. Briddon, "Interstitial hydrogen and the dissociation of C-H defects in GaAs," Mater. Sci. Forum., vols. 196-201, pp. 951-956, 1995.
-
Mater. Sci. Forum., Vols.
-
-
Breuer, S.J.1
Jones, R.2
Öberg, S.3
Briddon, P.R.4
-
18
-
-
0001701268
-
-
"Boron reactivation kinetics in hydrogenated silicon after annealing in the dark or under illumination," 43, pp. 4361-4372, 1991.
-
T. Zundel and J. Weber, "Boron reactivation kinetics in hydrogenated silicon after annealing in the dark or under illumination," Phys. Rev., vol. B43, pp. 4361-4372, 1991.
-
Phys. Rev., Vol. B
-
-
Zundel, T.1
Weber, J.2
-
19
-
-
0003158598
-
-
"Kinetics of minority-carrier-enhanced dissociation of hydrogen-dopant complexes in semiconductors," 45, pp. 11379-11382, 1992.
-
N. M. Johnson and C. Herring, "Kinetics of minority-carrier-enhanced dissociation of hydrogen-dopant complexes in semiconductors," Phys. Rev., vol. B45, pp. 11379-11382, 1992.
-
Phys. Rev., Vol. B
-
-
Johnson, N.M.1
Herring, C.2
-
20
-
-
21544462933
-
-
"Injection and drift of a positively charged hydrogen species in p-type GaAs," vol. 56, pp. 1457-1459, 1990.
-
A. J. Tavendale, S. J. Pearton, A. A. Williams, and D. Alexiev, "Injection and drift of a positively charged hydrogen species in p-type GaAs," Appl. Phys. Lett., vol. 56, pp. 1457-1459, 1990.
-
Appl. Phys. Lett.
-
-
Tavendale, A.J.1
Pearton, S.J.2
Williams, A.A.3
Alexiev, D.4
-
21
-
-
0005073562
-
-
"Species dependence of passivation and reactivation of acceptors in hydrogenated GaAs," vol. 68, pp. 3554-3563, 1990.
-
I. Szafranek and G. E. Stillman, "Species dependence of passivation and reactivation of acceptors in hydrogenated GaAs," J. Appl. Phys., vol. 68, pp. 3554-3563, 1990.
-
J. Appl. Phys.
-
-
Szafranek, I.1
Stillman, G.E.2
-
22
-
-
0018036428
-
-
"Recombination enhanced defect reactions," vol. 21, pp. 1391-1401, 1978.
-
L. C. Kimerling, "Recombination enhanced defect reactions," Solid State Electron., vol. 21, pp. 1391-1401, 1978.
-
Solid State Electron.
-
-
Kimerling, L.C.1
-
23
-
-
0027806358
-
-
"Improved reliability of AlGaAs/GaAs heterojunction bipolar transistors with a strain-relaxed base," in 1993 IEEE GaAs 1C Symp. Tech. Dig., New York, 1993, pp. 115-118.
-
H. Sugahara, J. Nagano, T. Nittono, and K. Ogawa, "Improved reliability of AlGaAs/GaAs heterojunction bipolar transistors with a strain-relaxed base," in Proc. 1993 IEEE GaAs 1C Symp. Tech. Dig., New York, 1993, pp. 115-118.
-
Proc.
-
-
Sugahara, H.1
Nagano, J.2
Nittono, T.3
Ogawa, K.4
-
24
-
-
0028598985
-
-
"Structural study of hydrogen induced platelet in Si and Ge by transmission electron microscopy," vol. 143-147, pp. 897-901, 1993.
-
S. Muto, S. Takeda, and M. Hirata, "Structural study of hydrogen induced platelet in Si and Ge by transmission electron microscopy," Mater. Sci. Forum., vol. 143-147, pp. 897-901, 1993.
-
Mater. Sci. Forum.
-
-
Muto, S.1
Takeda, S.2
Hirata, M.3
-
25
-
-
0028699420
-
-
"Effect of base dopant species on heterojunction bipolar transistor reliability," 28, pp. 232-237, 1994.
-
C. R. Abernathy and F. Ren, "Effect of base dopant species on heterojunction bipolar transistor reliability," Mater. Sci. Eng., vol. B28, pp. 232-237, 1994.
-
Mater. Sci. Eng., Vol. B
-
-
Abernathy, C.R.1
Ren, F.2
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