SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 409-414

CNx-layers prepared by plasma assisted chemical vapour deposition

(5) Gruger H a Selbmann, D a Wolf, E a Leonhardt, A a Arnold, B a

a IFW DRESDEN (Germany)

Author keywords

c3N4; Cnx Thin films; Plasma activated cvd

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; ELECTRON DIFFRACTION; FILM PREPARATION; FULLERENES; HYDROGEN; NITRIDES; PHASE COMPOSITION; PLASMA APPLICATIONS; TRANSMISSION ELECTRON MICROSCOPY;

CARBON NITRIDE; ELECTRON MICRODIFFRACTION PATTERNS; PLASMA POWER DENSITY; TETRACYANOETHYLENE;

THIN FILMS;

EID: 0038183013 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(96)03048-4 Document Type: Article

Times cited : (17)

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