Application of scanning capacitance microscopy to semiconductor devices

Nanotechnology

Volumn 8, Issue 3 SUPPL. A, 1997, Pages

  Nakagiri, Nobuyuki ^a   Yamamoto, Takuma ^a   Sugimura, Hiroyuki ^a,b   Suzuki, Yoshihiko ^a   Miyashita, Masayuki ^a   Watanabe, Shunji ^a  

^a NIKON CORPORATION   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FERROELECTRIC MATERIALS; GRAIN SIZE AND SHAPE; LEAD COMPOUNDS; MICROSCOPIC EXAMINATION; SEMICONDUCTING SILICON; SEMICONDUCTOR JUNCTIONS; THIN FILMS; VOLTAGE MEASUREMENT;

SCANNING CAPACITANCE MICROSCOPY (SCM);

NANOTECHNOLOGY;

EID: 0031235552     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/8/3A/007     Document Type: Article

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