Two-dimensional scanning capacitance microscopy measurements of cross-sectioned very large scale integration test structures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 426-432

  Neubauer, Gabi ^a   Erickson, Andrew ^a,d   Williams, Clayton C ^b   Kopanski, Joseph J ^c   Rodgers, Mark ^d   Adderton, Dennis ^d  

^a INTEL CORPORATION   (United States)

^b UNIVERSITY OF UTAH   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^d Digital Instruments   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000849397     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588487     Document Type: Article

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