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Applied Physics A: Materials Science and Processing

Volumn 69, Issue 5, 1999, Pages 529-536

Intrinsic stress of ultrathin epitaxial films

(1) Koch, R a,b

a PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK (Germany)

b FREIE UNIVERSITÄT BERLIN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; FILM GROWTH; STRAIN; STRESS ANALYSIS; ULTRATHIN FILMS;

STRANSKI-KRASTANOW MODE; VOLMER-WEBER MODE;

SEMICONDUCTING FILMS;

EID: 0033360168 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390051462 Document Type: Article

Times cited : (27)

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