Growth and characterisation of boron nitride thin films

Surface and Coatings Technology

Volumn 84, Issue 1-3, 1996, Pages 383-387

  Plass, M F ^a   Fukarek, W ^a   Kolitsch, A ^a   Kreissig U ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Boron nitride; Polarised IR reflection; Thin films

Indexed keywords

DEPOSITION; EVAPORATORS; FILM GROWTH; GRAIN BOUNDARIES; HARDNESS; INFRARED SPECTROSCOPY; ION BEAMS; MECHANICAL VARIABLES MEASUREMENT; PERMITTIVITY; SILICON; SILICON WAFERS; THIN FILMS;

ELECTRON BEAM EVAPORATION; HEAVY ION ELASTIC RECOIL DETECTION; ION BEAM ASSISTED DEPOSITION; MICROHARDNESS MEASUREMENT; POLARIZED INFRARED REFLECTION SPECTROSCOPY;

CUBIC BORON NITRIDE;

EID: 0030269599     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(95)02781-5     Document Type: Article

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