SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 81, Issue 1, 1996, Pages 72-78

Use of in situ ellipsometry to observe phase transitions during boron nitride thin film deposition

(3) McFall, W D a McKenzie, D R a Netterfield, R P b

a UNIVERSITY OF SYDNEY (Australia)

b CSIRO (Australia)

Author keywords

Cubic boron nitride; Ellipsometry; Helicon activated reactive evaporation

Indexed keywords

COMPRESSIVE STRESS; GROWTH MECHANISM; HELICON ACTIVATED REACTIVE EVAPORATION; IN SITU ELLIPSOMETRY;

CHEMICAL VAPOR DEPOSITION; CUBIC BORON NITRIDE; ELLIPSOMETRY; EVAPORATION; FILM GROWTH; GLASS; HELICONS; OPTICAL VARIABLES MEASUREMENT; PHASE TRANSITIONS; REFRACTIVE INDEX; SILICA; SILICON;

THIN FILMS;

EID: 0030141507 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/0257-8972(95)02619-3 Document Type: Article

Times cited : (9)

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