Measurement of mechanical properties for dense and porous polymer films having a low dielectric constant

Journal of Applied Physics

Volumn 88, Issue 10, 2000, Pages 5744-5750

  Xu, Yuhuan ^a   Tsai, Yipin ^a   Zheng, D W ^a   Tu, K N ^a   Ong, Chung Wo ^b   Choy, Chung Loong ^b   Zhao, Bin ^c   Liu, Q Z ^c   Brongo, Maureen ^c  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^c Rockwell Semiconductor Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010512521     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1287756     Document Type: Article

References (28)

1. The National Technology Roadmap for Semiconductors, Semiconductor Industry Association, San Jose, CA (1997).
2. W. W. Lee and P. S. Ho, MRS Bull. 22, 19 (1997).
3. J. P. Sullivan, D. R. Denison, J. C. Barbour, P. P. Newcomer, C. A. Apblett, C. H. Seager, and A. G. Baca, Mater. Res. Soc. Symp. Proc. 443, 149 (1997).
4. K. Endo, MRS Bull. 22, 55 (1997).
5. R. S. List, A. Singh, A. Ralston, and G. Dixit, MRS Bull. 22, 61 (1997).
6. N. H. Hendricks, Mater. Res. Soc. Symp. Proc. 443, 3 (1997).
7. R. N. Vrtis, K. A. Heap, W. F. Burgoyne, and L. M. Robeson, Mater. Res. Soc. Symp. Proc. 443, 171 (1997).
8. R. D. Miller, J. L. Hedrick, D. Y. Yoon, R. F. Cook, and J. P. Hummel, MRS Bull. 22, 44 (1997).
9. A. T. Kohl, R. Mimna, R. Shick, L. Rhodes, Z. L. Wang, and P. A. Kohl, Electrochem. Solid-State Lett. 2, 77 (1999).
10. C. M. Jin, J. D. Luttmer, D. M. Smith, and T. A. Ramos, MRS Bull. 22, 39 (1997).
11. C. H. Ting and T. E. Seidel, Mater. Res. Soc. Symp. Proc. 381, 3 (1995).
12. B. Zhao, S.-Q. Wang, M. Fiebig, S. Anderson, P. K. Vasudev, and T. E. Seidel, IEEE International Reliability Physics Proceedings (1996) pp. 156-163.
13. E. T. Ryan, A. J. McKerrow, J. Leu, and P. S. Ho. MRS Bull. 22, 49 (1997).
14. L. Peters, Semiconductor 21, 64 (1998).
15. Y. Xu, Y. Tsai, K. N. Tu, B. Zhao, Q. Z. Liu, M. Brongo, G. T. T. Sheng, and C. H. Tung, Appl. Phys. Lett. 75, 853 (1999).
16. C. N. Liao, Y. P. Tsai, Y. Xu, K. N. Tu, B. Zhao, Q. Z. Liu, and M. Brongo, J. Appl. Phys. (submitted).
17. W. W. Lee and P. S. Ho, MRS Bull. 22, 19 (1997).
18. M. Morgen, E. T. Ryan, J.-H. Zhao, C. Hu, T. Cho, and P. S. Ho, J. Met. 37 (1999).
19. J. W. Beams, in Structure and Properties of Thin Films, edited by C. A. Neugebauer, J. B. Newkirk, and D. A. Vermilyea (Wiley, New York, 1959), p. 183.
20. D. Maier-Schneider, A. Ersoy, J. Maibach, D. Schneider, and E. Obermeier, Sens. Mater. 7, 121 (1995).
21. J. Y. Pan, P. Lin, F. Maseeh, and S. D. Senturia, in Technical Digest IEEE Solid-State Sensors and Actuators Workshop (IEEE, New York, 1990), p. 70.
22. M. G. Allen, M. Mehregany, R. T. Howe, and S. D. Senturia, Appl. Phys. Lett. 51, 241 (1987).
23. W. R. LaFontaine, C. A. Paszkiet, M. A. Korhonen, and C. Y. Li, J. Mater. Res. 6, 2084 (1991).
24. G. M. Pharr and W. C. Oliver, MRS Bull. 17, 28 (1992).
25. D. W. Zheng, Y. Xu, Y. P. Tsai, K. N. Tu, P. Patterson, B. Zhao, Q. Z. Liu, and M. Brongo, Appl. Phys. Lett. 75, 2008 (2000).
26. D. W. Zheng, Ph.D dissertation, University of California at Los Angeles, 1999.
27. W. C. Oliver and G. M. Pharr, J. Mater. Res. 7, 1564 (1992).
28. B. N. Lucas, C. T. Rosenmayer, and W. C. Oliver, Mater. Res. Soc. Symp. Proc. 505, 97 (1998).