PLASMA CHEMICAL THERMOPHYSICS IN THE APPLICATION TO MATERIAL CONVERSION PROCESSES

Annual Review of Heat Transfer

Volumn 10, Issue , 1999, Pages 25-100

  Okazaki, Ken ^a   Watanabe, Takayuki ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY LAYERS; DIELECTRIC MATERIALS; ELECTRIC CORONA; GLOW DISCHARGES; HEAT TRANSFER; HIGH PRESSURE EFFECTS; HIGH PRESSURE ENGINEERING; PLASMA JETS;

CONVERSION PROCESS; EQUILIBRIUM CONDITIONS; FUNDAMENTAL STUDIES; HIGH PRESSURE; MATERIAL CONVERSIONS; NONEQUILIBRIUM CONDITIONS; NONEQUILIBRIUM PLASMAS; STUDY AND APPLICATIONS; THERMAL-EQUILIBRIUM; THERMOPHYSICS;

PLASMA SPRAYING;

EID: 0009634492     PISSN: 10490787     EISSN: 23750294     Source Type: Book Series    
DOI: 10.1615/AnnualRevHeatTransfer.v10.40     Document Type: Chapter

References (174)

1. K. Okazakí, A. Mizuno, and S. Yasuda, Highly-Nonequilibrium Plasma Chemistry at Atmospheric Pressure and Temperature in the Material Conversion Processes, Thermal Sci. Eng., Vol. 2, No. 1, pp. 21-27, 1994.
2. J. R. Roth, Industrial Plasma Engineering, Vol. 1, in Principles, p. 26, Institute of Physics Publishing, Bristol and Philadelphia, 1995.
3. M. Mitchner and C. H. Kruger, Partially Ionized Gases, Chap. I I, pp. 75-80, John Wiley & Sons, New York, 1973.
4. J. Mostaghimi, P. Proulx, and M. I. Boulos, An Analysis of the Computer Modeling of the Row and Temperature Fields in an Inductively Coupled Plasma, Numer. Heat Transfer, Vol. 8, pp. 187-201, 1985.
5. S. V. Patanker, Numer. Heat TransferandFluidFlow, McGraw-Hill, New York, 1980.
6. J. Mostaghimi and M. I. Boulos, Two-Dimensional Electromagnetic Field Effects in Induction Plasma Modeling, Plasma Chem. Plasma Processing, Vol. 9, pp. 25-AA, 1989.
7. X. Chen and E. Pfender, Modeling of RF Plasma Torch with a Metallic Tube Inserted for Reactant Injection, Plasma Chem. Plasma Processing, Vol. 11, pp. 103-128, 1991.
8. X. Chen and M. I. Boulos, Turbulence in Induction Plasma Modeling, J. Phys. D: Appi. Phys., Vol. 27, pp. 946-952, 1994.
9. H. Nishiyama, Y. Muro, and S. Kamiyama, The Control of Gas Temperature and Velocity fields of a RF Induction Thermal Plasma by Injecting Secondary Gas, J. Phys. D. Appi. Phys., Vol. 29, pp. 2634-2643, 1996.
10. T. Suekane, T. Taya, Y. Okuno, and S. Kabashima, Numerical Studies on the Nonequilibrium Inductively Coupled Plasma with Metal Vapor Ionization, IEEE Trans. Plasma Sci., Vol. 24, pp. 1147-1154, 1996.
11. Z. Njah, J. Mostaghimi, and M. I. Boulos, Mathematical Modeling of the 3-D Mixing in an Induction Plasma Reactor, Int. J. Heat Mass Transfer, Vol. 36, pp. 3909-3919, 1993.
12. T. Watanabe, N. Tonoike, T. Honda, and A. Kanzawa, Flow, Temperature and Concentration Fields in Reactive Plasmas in an Inductively Coupled RF Discharge, J. Chem. Eng. Jpn., Vol. 24, pp. 25-32, 1991.
13. T. Watanabe, A. Kanzawa, T. Ishigaki, and Y. Moriyoshi, Thermal Plasma Treatment of Titanium Carbide Powders: Part I. Numerical Analysis of Powder Behavior in Argon-Hydrogen and Argon-Nitrogen Radio Frequency Plasmas, J. Mater. Res., Vol. 11, pp. 2598-2610, 1996.
14. M. Sakano and T. Watanabe, Numerical and Experimental Analysis of Frequency Effect on Inductively Coupled Thermal Plasmas, Proc. 13th Inter. Symp. Plasma Chem., Vol. l,p.392-397, 1997.
15. A. Gaillat, R. M. Barnes, P. Proulx, and M. I. Boulos, Computer Simulation of Enclosed Inductively Coupled Plasma Discharges. Part 2. Molecular Gases, J. Anal-Atom. Spectrometry, Vol. 10, pp. 941-946, 1995.
16. D. T. Or, N. S. Subramanian, J. Heberlein, and E. Pfender, Modeling of High-Pressure, High-Frequency (RF) Oxygen Plasmas, IEEE Trans. Plasma Sci., Vol. 25, pp. 1034-1041, 1997.
17. M. Desilets, J. F. Bilodeau, and P. Proulx, Modelling of the Reactive Synthesis of Ultra-Fine Powders in a Thermal Plasma Reactor, J. Phys. D: Appi. Phys., Vol. 30, pp. 1951-1960, 1997.
18. R. Westhoff and J. Szekely, A Model of Fluid, Heat Flow, and Electromagnetic Phenomena in a Nontransferred Arc Plasma Torch, J. Appi. Phys., Vol. 70, pp. 3455-3466, 1991.
19. J. M. Bauchire, J. J. Gonzalez, and A. Gleizes, Modeling of a DC Plasma Torch in Laminar and Turbulent Flow, Plasma Chem. Plasma Processing, Vol. 17, pp. 409-432, 1997.
20. P. C. Huang, J. Heberlein, and E. Pfender, A Two-Fluid Model of Turbulence for a Thermal Plasma Jet, Plasma Chem. Plasma Processing, Vol. 15, pp. 25-t6, 1995.
21. C. H. Chang and J. D. Ramshaw, Numerical Simulations of Argon Plasma Jets Flowing into Cold Air, Plasma Chem. Plasma Processing, Vol. 13, pp. 189-209, 1993.
22. C. H. Chang and J. D. Ramshaw, Modeling of Nonequilibrium Effects in a High-Velocity Nitrogen-Hydrogen Plasma Jet, Plasma Chem. Plasma Processing, Vol. 16, pp. 5S-17S, 1996.
23. J. R. Fincke, C. H. Chang, W. D. Swank, and D. C. Haggard, Entrainment and Demixing in Subsonic Thermal Plasma Jets: Comparison of Measurements and Predictions, Int. J. Heat Mass Transfer, Vol. 37, pp. 1673-1682, 1994.
24. C. George, E. Pfender, and H. D. Steffens, Numerical Simulation of a Multi-Component Reacting Flow in a Supersonic DC Torch Nozzle, Proc. 9th Natl. Therm. Spray Conf., pp. 595-602, 1996.
25. C. George, G. Candler, R. Young, E. Pfender, and J. Heberlein, Nozzle Optimization for Dissociated Species Transport in Low Pressure Plasma Chemical Vapor Deposition, Plasma Chem. Plasma Processing, Vol. 16, pp. 43S-56S, 1996.
26. K. C. Hsu, K. Etemadi, and E. Pfender, Study of the Free-Burning High-Intensity Argon Arc, J. Appi. Phys., Vol. 54, pp. 1293-1301, 1983.
27. J. J. Gonzalez, A. Gleizes, P. Proulx, and M. Boulos, Mathematical Modeling of a Free-Burning Arc in the Presence of Metal Vapor, J. Appi. Phys., Vol. 74, pp. 3065-3070, 1993.
28. J. Jenista, J. V. R. Heberlein, and E. Pfender, Numerical Model of the Anode Region of High-Current Electric Arcs, IEEE Trans. Plasma Sci., Vol. 25, pp. 883-890,1997.
29. R. T. C. Choo, J. Szekely, and R. C. Westhoff, On the Calculation of the Free Surface Temperature of Gas-Tungsten-Arc Weld Pools from First Principles: Part I. Modeling the Welding Arc, Metali. Trans. B, Vol. 23B, pp. 357-369, 1992.
30. R. T. C. Choo, J. Szekely, and R. C. Westhoff, On the Calculation of the Free Surface Temperature of Gas-Tungsten-Arc Weld Pools from First Principles: Part I I . Modeling the Weld Pool and Comparison with Experiments Arc, Metali. Trans. B, Vol. 23B, pp. 371-384, 1992.
31. J. J. Lowke, R. Morrow, J. Haidar, and A. B. Murphy, Prediction of Gas Tungsten Arc Welding Properties in Mixture of Argon and Hydrogen, IEEE Trans. Plasma Sci., Vol. 25, pp. 925-930, 1997.
32. M. Suzuki, Y. Sato, and H. Akatsuka, Numerical Analysis of the Behavior of Hydrogen Added into a Free-Burning Arc, Plasma Chem. Plasma Processing, Vol. 16, pp. 399-415. 1996.
33. S. C. Snyder, A. B. Murphy, D. L. Hofeldt, and L. D. Reynolds, Diffusion of Atomic Hydrogen in an Atmospheric-Pressure Free Burning Arc Discharge, Phys. Rev. E, Vol. 52, pp. 2999-3009, 1995.
34. A. B. Murphy, The Influence of Demixing on the Properties of a Free-Burning Arc, Appi. Phys. Lett., Vol. 69, pp. 328-330, 1996.
35. A. B. Murphy, Modelling and Diagnostics of Plasma Chemical Processes in Mixed-Gas Arcs, Pure Appi. Chem., Vol. 68, pp. 1137-1142, 1996.
36. J. Grey, P. F. Jacobs, and M. P. Sherman, Calorimetrie Probe for the Measurement of Extremely High Temperatures, Rev. Sci. Instrum., Vol. 33, pp. 738-741, 1962.
37. W. D. Swank, J. R. Finke, and D. C. Haggard, Modular Enthalpy Probe and Gas Analyzer for Thermal Plasma Measurements, Rev. Sci. Instrum., Vol. 64, pp. 56-62, 1993.
38. M. Rahmane, G. Soucy, and M. I. Boulos, Analysis of the Enthalpy Probe Technique for Thermal Plasma Diagnostics, Rev. Sci. Instrum., Vol. 66, pp. 3424-3431, 1995.
39. M. Jankovic and J. Mostaghimi, Thermally Induced Measurement Error by a Water-Cooled Enthalpy Probe, Plasma Chem. Plasma Processing, Vol. 18, pp. 54-71, 1998.
40. W. L. T. Chen, J. Heberlein, and E. Pfender, Diagnostics of a Thermal Plasma Jet by Optical Emission Spectroscopy and Enthalpy Probe Measurements, Plasma Chem. Plasma Processing, Vol. 14, pp. 317-332, 1994.
41. J. R. Fincke, S. C. Snyder, and W. D. Swank, Comparison of Enthalpy Probe and Laser Light Scattering Measurement of Thermal Plasma Temperature and Velocities, Rev. Sci. Instrum., Vol. 64, pp. 711-718, 1993.
42. J. R. Fincke, W. D. Swank, S. C. Snyder, and D. C. Haggard, Enthalpy Probe Performance in Compressible Thermal Plasma Jets, Rev. Sci. Instrum., Vol. 64, pp. 3585-3593, 1993.
43. J. R. Fincke, W. D. Swank, and D. C. Haggard, Entrainment and Demixing in Subsonic Argon/Helium Thermal Plasma Jets, J. Thermal Spray Technol., Vol. 2, pp. 345-350, 1993.
44. G. Soucy, J. W. Jurewicz, and M. I. Boulos, Mixing Study of the Induction Plasma Reactor: Part I. Axial Injection Mode, Plasma Chem. Plasma Processing, Vol. 14, pp. 43-58, 1994.
45. G. Soucy, J. W. Jurewicz, and M. I. Boulos, Mixing Study of the Induction Plasma Reactor: Part I I . Radial Injection Mode, Plasma Chem. Plasma Processing, Vol. 14, pp. 59-71, 1994.
46. 3 for an Induction Plasma Reactor Design, Plasma Chem. Plasma Processing, Vol. 15, pp. 693-710, 1995.
47. B. Davies and G. Soucy, Experimental Study of the Heat and Mass Transfer in a High-Frequency Thermal Plasma Reactor, IEEE Trans. Plasma Sci., Vol. 25, pp. 1052-1057, 1997.
48. B. W. Yu and S. L. Girshick, Atomic Carbon Vapor as a Diamond Growth Precursor in Thermal Plasmas, J. Appi. Phys., Vol. 75, pp. 3914-3923, 1994.
49. D. Kolman, J. Heberlein, E. Pfender, and R. Young, Two-Dimensional Model for Thermal Plasma Chemical Vapor Deposition, Plasma Chem. Plasma Processing, Vol. 16, pp. 57S-69S, 1996.
50. D. Kolman, J. Heberlein, E. Pfender, and R. Young, A Three-Dimensional Two-Phase Model for Thermal Plasma Chemical Vapor Deposition with Liquid Feedstock Injection, Plasma Chem. Plasma Processing, Vol. 18, pp. 73-89, 1998.
51. J. O. Berghaus, J. L. Meunier, and F. Gitzhofer, Local Growth Studies of C V D Diamond Using a Probe-Like Substrate, IEEE Trans. Plasma Sci., Vol. 25, pp. 1058-1965, 1997.
52. C. H. Kruger, T. G. Owano, and C. O. Laux, Experimental Investigation of Atmospheric Pressure Nonequilibrium Plasma Chemistry, IEEE Trans. Plasma Sci., Vol. 25, pp. 1042-10512, 1997.
53. E. Pfender, Particle Behavior in Thermal Plasmas, Plasma Chem. Plasma Processing, Vol. 9, pp. 167S-194S, 1989.
54. R. M. Young and E. Pfender, Nusselt Number Correlations for Heat Transfer to Small Spheres in Thermal Plasma Flows, Plasma Chem. Plasma Processing, Vol. 7, pp. 211-229, 1987.
55. Y. C. Lee, K. C. Hsu, and E. Pfender, Modeling of Particles Injected into a D.C. Plasma Jet, Proc. Inter. Symp. Plasma Chem., pp. 795-804, 1981.
56. S. Paik, H. D. Ngyuyen, and J. N. Chung, A Study of Argon Thermal Plasma Flow over a Solid Sphere, J. Fluid Mech., Vol. 252, pp. 543-564, 1993.
57. S. Paik and H. D. Ngyuyen, Momentum and Heat Transfer of a Translating Liquid Droplet under a Thermal Plasma Environment, Phys. Plasmas, Vol. 1, pp. 2383-2397,1994.
58. X. Chen and E. Pfender, Effect of the Knudsen Number on Heat Transfer to a Particle Immersed into a Thermal Plasma, Plasma Chem. Plasma Processing, Vol. 3, pp. 97-113, 1983.
59. A. G. Gnedovets and A. A. Uglov, Enhancement of Heat Transfer from a Rarefied Plasma Flow to Thermoemitting Particle, Plasma Chem. Plasma Processing, Vol. 12, pp. 371-382, 1992.
60. A. G. Gnedovets and A. A. Uglov, Heat Transfer to Nonspherical Particles in a Rarefied Plasma Flow, Plasma Chem. Plasma Processing, Vol. 12, pp. 383-102, 1992.
61. A. G. Gnedovets, A. V. Gusarov, and A. A. Uglov, Effects of Debye Screening on Heat Transfer to a Spherical Particle from Rarefied Plasma, Plasma Chem. Plasma Processing, Vol. 13, pp. 633-653, 1993.
62. A. G. Gnedovets, Kinetic Models of Plasma-Particle Charge, Momentum and Energy Transfer under Rarefied Flow Conditions, Pure Appi. Chem., Vol. 68, pp. 1127-1132, 1996.
63. X. Chen, J. Chen, and Y. Wang, Heat Transfer from a Rarefied Plasma Flow to a Metallic Particle with High Surface Temperature, J. Phys. D: Appi. Phys., Vol. 27, pp. 1637-1645, 1994.
64. X. Chen, J. Chen, and Y. Wang, Unsteady Heating of Metallic Particles in a Rarefied Plasma, Plasma Chem. Plasma Processing, Vol. 15, pp. 199-219, 1995.
65. X. Chen and X. Tao, Thermophoretic Force on a Metallic or Nonmetallic Particle Immersed into a Rarefied Plasma, Plasma Chem. Plasma Processing, Vol. 12, pp. 345-370, 1992.
66. X. Chen and X. Tao, An Improvement Analysis of the Thermophoretic Force on a Small Particle Suspended in a Rarefied Plasma, J. Phys. D: Appi. Phys., Vol. 26, pp. 590-597, 1993.
67. X. Chen and X. Tao, Thermophoretic Force Acting on an Evaporating Particle in a Rarefied Plasma, Plasma Chem. Plasma Processing, Vol. 14, pp. 163-192, 1994.
68. X. Chen, J. Qiu, and J. Yang, An Experimental Study on the Drag Force on a Sphere Exposed to an Argon Thermal Plasma Flow, Plasma Chem. Plasma Processing, Vol. 11, pp. 151-168, 1991.
69. J. R. Fincke, W. D. Swank, C. L. Jeffery, and C. A. Mancuso, Simultaneous Measurement of Particle Size, Velocity and Temperature, Meas. Sci. Technol., Vol. 4, pp. 559-565, 1993.
70. R. Westhoff, G. Trapaga, and J. Szekely, Plasma-Particle Interactions in Plasma Spraying Systems, Metali. Trans. B, Vol. 23B, pp. 683-693, 1992.
71. S. Paik, X. Chen, P. Kong, and E. Pfender, Modeling of a Counterflow Plasma Reactor, Plasma Chem. Plasma Processing, Vol. 11, pp. 229-249, 1991.
72. J. H. Park and S. H. Hong, Numerical Analysis of Nitrogen-Mixed Argon Plasma Characteristics and Injected Particle Behavior in an ICP Torch for Ultrafine Powder Synthesis, IEEE Trans. Plasma Sci., Vol. 23, pp. 532-538, 1995.
73. P. C. Huang, J. Heberlein, and E. Pfender, Particle Behavior in a Two-Fluid Turbulent Plasma Jet, Surface Coating Technol., Vol. 73, pp. 142-151, 1995.
74. C. T. Crowe, M. P. Sharma, and D. E. Stock, The Particle-Source-In Cell (PSI-C E L L) Model for Gas-Droplet Flows, J. Fluids Eng., Vol. 99, pp. 325-332, 1977.
75. J. F. Bilodeau and P. Proulx, A Mathematical Model for Ultrafine Iron Powder Growth in a Thermal Plasma, Aerosol Sci. Technol, Vol. 24, pp. 175-189, 1996.
76. J. Madejski, Solidification of Droplets on a Cold Surface, Int. J. Heat Mass Transfer, Vol. 19, pp. 1009-1013, 1976.
77. G. Trapaga and J. Szekely, Mathematical Modeling of the Isothermal Impingement of Liquid Droplets in Spraying Processes, Metali. Trans. B, Vol. 22B, pp. 901-914,1991.
78. T. Watanabe, I. Kuribayashi, T. Honda, and A. Kanzawa, Deformation and Solidification of a Droplet on a Cold Substrate, Chem. Eng. Sci., Vol. 47, pp. 3059-3065, 1992.
79. T. Yoshida, T. Okada, H. Hamatani, and H. Kumaoka, Integrated Fabrication Process for Solid Oxide Fuel Cells Using Novel Plasma Spraying, Plasma Sources Sci. Technol, Vol. 1, pp. 195-201, 1992.
80. H. Liu, E. J. Lavernia, and R. H. Range], Numerical Simulation of Impingement of Molten T i, Ni, and W Droplets on a Flat Substrate, J. Therm. Spray Tech., Vol. 2, pp. 369-378, 1993.
81. M. Bertagbnolli, M. Marchese, and G. Jacucci, Modeling of Particle Impacting on a Rigid Substrate under Plasma Spraying Conditions, J. Therm. Spray Technol, Vol. 4, pp. 41-49, 1995.
82. M. Pasandideh-Fard and J. Mostaghimi, On the Spraying and Solidification of Molten Particles in a Plasma Spray Process: Effect of Thermal Contact Resistance, Plasma Chem. Plasma Processing, Vol. 16, pp. 83S-98S, 1996.
83. M. Bussuman, J. Mostaghimi, and S. Chandra, On a Three-Dimensional Model of Droplet Impact, Proc. 3rd Asia-Pacific Conf. Plasma Sci. Technol, pp. 95-100, 1996.
84. M. Vardelle, A. Vardelle, P. Fauchais, and C. Moreau, Pyrometer System for Monitoring the Particle Impact on a Substrate during a Plasma Spray Process, Meas. Sci. Technol, Vol. 5, pp. 205-212, 1994.
85. C. Moreau, M. Lamontagme, and P. Cielo, Influence of the Coating Thickness on the Cooling Rates of Plasma-Sprayed Particles Impinging on a Substrate, Surface Coating Technol, Vol. 53, pp. 107-114, 1992.
86. M. Vardelle, A. Vardelle, A. C. Léger, P. Fauchais, and D. Goblin, Influence of Particle Parameters at Impact on Splat Formation and Solidification in Plasma Spray Processes, J. Therm. Spray Technol, Vol. 4, pp. 50-58, 1994.
87. C. Moreau, P. Gougeon, and M. Lamontagme, Influence of Substrate Preparation on the Flattening and Cooling of Plasma-Sprayed Particles, J. Therm. Spray Technol, Vol. 4, pp. 25-33, 1995.
88. T. Ishigaki, Y. Moriyoshi, T. Watanabe, and A. Kanzawa, Thermal Plasma Treatment of Titanium Carbide Powders: Part I I . In-Flight Formation of Carbon-Site Vacancies and Subsequent Nitridation in Titanium Carbon Powders during Induction Plasma Treatment, J. Mater. Res., Vol. 11, pp. 2811-2610, 1996.
89. X. Fan, T. Ishigaki, and Y. Sato, Phase Formation in Molybdenum Disilicide Powders during In-Flight Induction Plasma Treatment, /. Mater. Res., Vol. 12, pp. 1315-1326, 1997.
90. 2, J. Cryst. Growth, Vol. 171, pp. 166-173, 1997.
91. A. Notomi and N. Hisatome, Application of Plasma Spraying to Solid Oxide Fuel Cell Production, Pure Appi. Chem., Vol. 68, pp. 1101-1106, 1996.
92. T. Yoshida, The Future of Thermal Plasma Processing for Coating, Pure Appi. Chem., Vol. 66, pp. 1223-1230, 1994.
93. J. Tsujino, N. Tatsumi, and Y. Shiohara, Superconducting Y B - C - O, Films Prepared on Y S Z Polycrystalline Substrates by RF Thermal Plasma Evaporation, J. Mater. Res., Vol. 9, pp. 1089-1097, 1994.
94. K. Hayasaki, Y. Takamura, N. Yamaguchi, K. Terashima, and T. Yoshida, Scanning Tunneling Microscopy of Epitaxial Y B a j C - O,,, Films Prepared by Thermal Plasma Flash Evaporation Method, J. Appi. Phys., Vol. 81, pp. 1222-1226, 1997.
95. J. Tsujino, H. Yakabe, and Y. Shiohara, Growth Mechanisms of YBajCujO, Films Prepared by RF Thermal Plasma Evaporation, Jpn. J. Appi. Phys., Vol. 35, pp. 1706-1711, 1996.
96. P. Tandian and E. Pfender, Heat Transfer in RF Plasma Sintering: Modeling and Experiments, Plasma Chem. Plasma Processing, Vol. 17, pp. 353-370, 1997.
97. G. Capriati, G. Colonna, C. Gorse, and M. Capitelli, A Parametric Study of Electron Energy Distributution Functions and Rate and Transport Coefficients in Nonequilibrium Helium Plasmas, Plasma Chem. Plasma Processing, Vol. 12, No. 3, pp. 237-260, 1992.
98. 2 Plasma, Plasma Chem. Plasma Processing, Vol. 17, No. 3, pp. 305-314, 1997.
99. A. P. Smiraov, N. V. Suetin, and A. B. Shmelev, Two-dimensional Bounce-Averaged Fokker-Planck Modelling of an Electron Cyclotron Resonance Plasma Source, J. Plasma Physics, Vol. 59, Pt. 2, pp. 243-257, 1998.
100. N. Peyraud-cuenca and P. Faucher, Kinetic Theory of High-Frequency and Low-Pressure Atomic Discharges, J. Plasma Physics, Vol. 58, Pt. 1, pp. 123-143, 1997.
101. J-H. Tsai and C H . J. Wu, Non-Equilibrium Radial and Axial Transport in RF Glow Discharges, J. Phys. D: Appi. Phys., Vol. 26, pp. 496-199, 1993.
102. Z. Wang, A. J. Lichtenberg, and R. H. Cohen, Kinetic Theory of Stochastically Heated RF Capacitive Discharges, IEEE Trans. Plasma Sci., Vol. 26, No. 1, pp. 59-68, 1998.
103. I. V. Adamovich and J. W. Rich, The Effect of Superelastic Electron-Molecule Collisions on the Vibrational Energy Distribution Function, J. Phys. D: Appi. Phys., Vol. 30, pp. 1741-1745, 1997.
104. 2 Glow Discharge, Plasma Sources and Sci. Technol, Vol. 6, pp. 373-385, 1997.
105. 3 Molecules, Plasma Physics Report, Vol. 23, No. 2, pp. 165-171,1997.
106. F. Signeger and R. Winkler, Spatial Relaxation of Electrons in Nonisothermal Plasmas, Plasma Chem. Plasma Processing, Vol. 17, No. 1, pp. 1-19, 1997.
107. V. P. Silakov, A. A. Matveyev, A. V. Chebotarev, and D. K. Otorbaev, Non-Equilibrium Properties of a Flowing Hydrogen Cascaded Arc Plasma: Kinetic Modelling, J. Phys. D: Appi. Phys., Vol. 29, pp. 2111-2118, 1996.
108. S. Al-Hawat, Spectroscopic Diagnostics of Preanode Plasma in Glow Discharge of Helium, IEEE Trans. Plasma Sci., Vol. 25, No. 5, pp. 1124-1127, 1997.
109. L. Thomas, J. L. Jauberteau, I. Jauberteau, J. Aubreton, and A. Catherinot, Characterization of an Argon-Hydrogen Microwave Discharge Used as an Atomic Hydrogen Source. Effect of Hydrogen Dilution on the Atomic Hydrogen Production, Plasma Chem. Plasma Processing, Vol. 17, No. 2, pp. 193-206, 1997.
110. S. V. Avtaeva, M. Z. Mamytbekov, and D. K. Otorbaev, Diagnostics of Magnetically Enhanced RF Discharges in Methane, Argon and Methane-Argon Mixtures, J. Phys. D: Appi. Phys., Vol. 30, pp. 3000-3007, 1997.
111. S. Gundermann and R. Winkler, Experimental Check of the High-Frequency Behavior of the Electrons in Molecular and Atomic Gas Plasmas, Plasma Chem. Plasma Processing, Vol. 17, No. 3, pp. 263-280, 1997.
112. B. Eliasson and U. Kogelschatz, Nonequilibrium Volume Plasma Chemical Processing, IEEE Trans. Plasma Sci., Vol. 19, No. 6, pp. 1063-1077, 1991.
113. U. Kogelschatz, B. Eliasson, and W. Egli, Dielectric Barrier Discharges: Principle and Applications, Invited Plenary Lecture, Int. Conf. on Phenomena in Ionized Gases (ICPIG XXni), pp. 1-20, 1997.
114. S. Kanazawa, M. Kogoma, T. Moriwaki, and S. Okazaki, Stable Glow Plasma at Atmospheric Pressure, J. Phys. D: Appi. Phys., Vol. 21, pp. 838-840, 1988.
115. M. M. Kekez, M. R. Barrault, and J. D. Craggs, Spark Channel Formation, J. Phys. D: Appi. Phys., Vol. 3, pp. 1886-1896, 1970.
116. S. Okazaki, M. Kogoma, M. Uehara, and Y. Kimura, Appearance of Stable Glow Discharge in Air, Argon, Oxygen and Nitrogen at Atmospheric Pressure Using a 50 Hz Source, J. Phys. D: Appi. Phys., Vol. 26, pp. 889-892, 1993.
117. B. Eliasson, M. Hirth, and U. Kogelschatz, Ozone Synthesis from Oxygen in Dielectric Barrier Discharges, J. Phys. D: Appi. Phys., Vol. 20, pp. 1421-1437, 1987.
118. M. Kogoma and S. Okazaki, Raising of Ozone Formation Efficiency in a Homogeneous Glow Discharge Plasma at Atmospheric Pressure, J. Phys. D: Appi. Phys., Vol. 27, pp. 1985-1987, 1994.
119. F. Massines, C. Mayoux, R. Messaoudi, A. Rabehi, and P. Segur, Experimental Study of an Atmospheric Pressure Glow Discharge. Application to Polymers Surface Treatment, Gas Discharges and Their Appi. (GD 92), Vol. I I, pp. 730-733, 1992.
120. F. Massines, R. B. Gadri, P. Decomps, A. Rabehi, P. Segur, and C. Mayoux, Atmospheric Pressure Dielectric Controlled Glow Discharges: Diagnostics and Modelling, Phenomena in Ionized Gases, Invited Papers, Vol. 31, pp. 306-315,1995.
121. Y. Torimoto, A. Harano, T. Suda, and M. Sadakata, Emission of O-Radical Anions from a Solid Electrolyte Surface into the Gas Phase, Jpn. J. Appi. Phys., Vol. 36, No. 2B, pp. L238-L240, Part 2, 1997.
122. Y. Wang, On O-Emission from Cesium-Coated Surfaces, J. Chem. Phys., Vol. 102, No. 1, pp. 525-528, 1995.
123. J. S. Chang, T. Myint, A. Chakrabarti, and A. Miziolek, Removal of Carbon Tetrachloride from Air Stream by a Corona Torch Plasma Reactor, Jpn. J. Appi. Phys., Vol. 36, pp. 5018-5024, 1997.
124. G. Dìnelli, L. Civitano, and M. Rea, Industrial Experiments on Pulse Corona Simultaneous Removal of NOx and S02 from Flue Gas, IEEE Trans. Ind. Appi., Vol. 26, No. 3, pp. 535-541, 1990.
125. K. Okazaki, A. Mizuno, K. Shimizu, and T. Niwa, Application of Semi-Wet Type Corona Discharge Reactor to the Simultaneous Removal of NOx, SOx and Fly Ash in Pulverized Coal Combustion, Proc. of the JSME-ASME Jt. Int. Conf. on Power Eng. '93 (ICOPE-93), Vol. 2, pp. 103-108, 1993.
126. 2 from Gas Streams Using a Dielectric Barrier Discharge and Combined Plasma Photolysis, J. Appi. Phys., Vol. 69, No. 8, pp. 4409-1417, 1991.
127. J. S. Chang, P. C. Looy, K. Nagai, T. Yoshioka, S. Aoki, and A. Maezawa, Preliminary Pilot Plant Tests of a Corona Discharge-Electron Beam Hybrid Combustion Flue Gas Cleaning System, IEEE Trans. Ind. Appi., Vol. 32, No. 1, pp. 131-137, 1996.
128. S. Masuda, K. Akutsu, M. Kuroda, Y. Awatsu, and Y. Shibuya, A Ceramic-Based Ozonizer Using High-Frequency Discharge, IEEE Trans. Ind. Appi, Vol. 24, No. 2, pp. 223-231, 1988.
129. R. C. Sze, Large-Area Surface Discharge UV Light Source for Materials Processing Applications, Proc. SPIE Int. Soc. Opt. Eng. USA, Vol. 2987, pp. 88-93, 1997.
130. J. Kitayama and M. Kuzumoto, Theoretical and Experimental Study on Ozone Generation Characteristics of an Oxygen-Fed Ozone Generator in Silent Discharge, J. Phys. D: Appi. Phys., Vol. 30, pp. 2453-2461, 1997.
131. 2 in Argon. I I . Electron Distributions and Excitation Rates, J. Chem. Phys., Vol. 74, No. 8, pp. 4445-449, 1981.
132. 2.1: Fast Method of Space-Charge Dominated Plasma Simulation, J. Phys. D: Appi. Phys., Vol. 27, pp. 2556-2563,1994.
133. N. Y. Babaeva and G. V. Naidis, Two-Dimensional Modelling of Positive Streamer Dynamics in Non-Uniform Electric Fields in Air, J. Phys. D: Appi. Phys., Vol. 29, pp. 2423-2431, 1996.
134. R. Morrow and J. J. Lowke, Streamer Propagation in Air, J. Phys. D: Appi. Phys., Vol. 30, pp. 614-627, 1997.
135. P. A. Vitello, B. M. Penetrante, and J. N. Bardsley, Simulation of Negative-Streamer Dynamics in Nitrogen, Phys. Rev. E, Vol. 49, No. 6, pp. 5574-5598, 1994.
136. R. Peyrous, P. Pignolet, and B. Held, Kinetic Simulation of Gaseous Species Created by an Electrical Discharge in Dry or Humid Oxygen, J. Phys. D: Appi. Phys., Vol. 22, pp. 1658-1667, 1989.
137. B. Eliasson, W. Egli, and U. Kogelschatz, Modelling of Dielectric Barrier Discharge Chemistry, Pure & Appi. Chem., Vol. 66, No. 6, pp. 1275-1286, 1994.
138. W. Egli and B. Eliasson, Numerical Calculation of Electrical Breakdown in Oxygen in a Dielectric-Barrier Discharge, Helv. Phys. Acta, Vol. 62, pp. 302-305, 1989.
139. B. Eliasson and U. Kogelschatz, Modeling and Applications of Silent Discharge Plasmas, IEEE Trans. Plasma Sci., Vol. 19, No. 2, pp. 309-323, 1991.
140. B. Eliasson, M Hirth, and U. Kogelschatz, Ozone Synthesis from Oxygen in Dielectric Barrier Discharges, J. Phys. D: Appi. Phys., Vol. 20, pp. 1421-1437, 1987.
141. D. Braun, U. Kuchler, and G. Pietsch, Microdischarges in Air-Fed Ozonizers, J. Phys. D: Appi. Phys., Vol. 24, pp. 564-572, 1991.
142. K. Okazaki and S. Yasuda, Active Control of Nucleation Process in Plasma C V D by Ultra-Short High-Voltage Pulses, Proc. I2th Int. Symp. Plasma Chemistry (ISPC-12), Vol. I V, pp. 2155-2160, 1995.
143. K. Okazaki, S. Yasuda, and S. Hirai, Simulation for Formation Process of Stratified Structure in Ultra-Short High-Voltage Pulse Plasma, Proc. 13th Int. Symp. Plasma Chemistry (ISPC-13), Vol. IT, pp. 760-765, 1997.
144. A. Mizuno, A. Chakrabarti, and K. Okazaki, Application of Corona Technology to the Reduction of Greenhouse Gases and Other Gaseous Pollutants, Non-Thermal Plasma Technologies for Pollution Control (B. M. Penetrante and S. E. Schultheis, Eds.), NATO A S I Series, Series G: Ecological Sciences, Springer-Verlag, Vol. 34, Part B, pp. 165-185, 1995.
145. A. Mizuno, J. S. Clements, and R. H. Davis, A Method for the Removal of Sulfur Dioxide from Exhaust Gas Utilizing Pulsed Streamer Corona for Electron Energization, IEEE Trans, on Ind. Appi, Vol. 22, No. 3, pp. 516-522, 1986.
146. A. Mizuno, K. Shimizu, T. Matsuoka, and S. Furuta, Reactive Absorption of Nox Using Wet Discharge Plasma Reactor, IEEE Trans, on Ind. Appi, Vol. 31, No. 6, pp. 1463-1468, 1995.
147. T. Oda, T. Takahashi, H. Nakano, and S. Masuda, Decomposition of Fluorocarbon Gaseous Contaminants by Surface Discharge-Induced Plasma Chemical Processing, IEEE Trans, on Ind. Applic, Vol. 29, pp. 787-792, 1993.
148. B. M. Penetrante, Pollution Control Applications of Pulsed Power Technology, Proc. 9th IEEE Pulsed Power Conf, pp. 1-5, 1993.
149. K. Hijikata, Total Energy System in the Future, IEA Int. Conf. on Technology Responses to Global Environmental Challenges, Kyoto, pp. 359-370, 1991.
150. 2 Catalyst in an Excess Amount of Water Vapor, Report of Research Project, Grant-in-Aid on Priority Areas (No. 256), Ministry of Education, Science, Sports and Culture, Japan, A01-06, 1998.
151. K. Okazaki, T. Nozaki, Y. Uemitsu, S. Yasuda, and K. Hijikata, Direct Conversion of Methane to Methanol and Effect of Basic Factors in Nonequili-brium Plasma at Atmospheric Pressure, Bull. JSME, Ser. B, Vol. 61, pp. 4471-4476, 1995.
152. K. Okazaki, T. Nozaki, Y. Uemitsu, and K. Hijikata, Direct Conversion from Methane to Methanol by a Pulsed Silent Discharge Plasma, Proc. 12th Int. Symp. on Plasma Chemistry (ISPC-12), Vol. I I, pp. 581-586, 1995.
153. L. M. Zhou, B. Xue, U. Kogelschatz, and B. Eliasson, Partial Oxidation of Methane to Methanol with Oxygen or Air in a Nonequilibrium Discharge Plasma, Plasma Chem. Plasma Processing, Vol. 18, No. 3, pp. 375-393, 1998.
154. K. Okazaki, S. Yasuda, and S. Hirai, Analysis of Formation Process of High-Voltage Ultra-Short Pulsed Plasma, Bull. JSME, Ser. B, Vol. 63, pp. 2166-2174, 1997.
155. K. Okazaki, N, Yamada, T. Kishida, K. Ogawa, and S. Hirai, Direct Synthesis of Methanol from Methane and Water-Vapor Mixture Using Ultra-Short Pulse Plasma, Bull. JSME, Ser. B, Vol. 64, No. 625, pp. 3052-3059, 1998.
156. K. Okazaki, K. Ogawa, N. Yamada, and T. Kishida, Direct Synthesis of Methanol from Methane and Water-Vapor Mixtures Using Plasma Chemical Reactions, Report of Research Project, Grant-in-Aid on Priority Areas (No. 256), Ministry of Education, Science, Sports and Culture, Japan, A01-01, 1998.
157. J. Salge and P. Braumann, The Influence of the Voltage Wave on the Formation of Ozone, Proc. 4th Int. Symp. Plasma Chem., pp. 735-741, 1979.
158. M. Shimizu, T. Nagahara, K. Yamamoto, Y. Kamase, F. Yamaguchi, T. Benibayashi, and A. Mizuno, Development of Ozone Generator Operated with Fast Rising Voltage, Proc. IOA 10th Ozone World Congress, pp. 90-101, 1991.
159. K. Yoshida and H. Tagashira, The Influence of the Voltage Rise Time on the Ozone Efficiency in an Ozonizer, J. Jpn. Res. Group ofElect. Discharge, ED-87-56, pp. 29-38, 1987.
160. K. Ishimaru and K. Okazaki, Efficient Generation of Active Oxygen Species by Highly Nonequilibrium Pulsed Silent Discharge Plasma, Microscale Thermophys. Eng., Vol. 1, No. 2, pp. 159-169, 1997.
161. K. Honda and Y. Naito, On the Nature of Silent Electric Discharge, J. Phys. Soc. Jpn., Vol. 10, No. 11, pp. 1007-1011, 1955.
162. S. Nguyen, D. Dobuzinsky, D. Harmon, R. Gleason, and S. Fridmann, Reaction Mechanisms of Plasma- and Thermal-Assisted Chemical Vapor Deposition of Tetraethylorthosilicate Oxide Films, J. Electrochem. Soc, Vol. 137, No. 7, pp. 2209-2215, 1990.
163. 2 Deposition by Tetraethoxy silane with Chemically and Energetically Different Atomic Species, Jpn. J. Appi. Phys., Vol. 33(1-6A), pp. 3520-3527, 1994.
164. S. K. Ray, C. K. Maiti, S. K. Lahiri, and N. B. Chakrabarti, Properties of Silicon Dioxide Films Deposited at Low Temperatures by Microwave Plasma Enhanced Decomposition of Tetraethylorthosilicate, J. Vac. Sci. Technol., Vol. B10 (3), pp. 1139-1150, 1992.
165. 2 films using TEOS and Oxygen, Thin Solid Films, Vol. 241, pp. 251-254, 1994.
166. C. S. Pai, J. F. Miner, and P. D. Foo, Electron Cyclotron Resonance Microwave Discharge for Oxide Deposition Using Tetraethoxysilane, J. Electrochem. Soc, Vol. 139, No. 3, pp. 850-856, 1992.
167. G. B. Raupp and T. S. Cale, The Role of Oxygen Excitation and Loss in Plasma-Enhanced Deposition of Silicon Dioxide from Tetrathylorthosilicate, J. Vac. Sci. Technol., Vol. B10(l), pp. 37-15, 1992.
168. 2 Using Oxygen/Tetraethoxysilane Chemistry, /. Vac. Sci. Technol., Vol. A l l (5), pp. 2562-2571, 1993.
169. T. Kawahara, A. Yuuki, and Y. Matsui, Reaction Mechanism of Chemical Vapor Deposition Using Tetraethylorthosilicate and Ozone at Atmospheric Pressure, Jpn. J. Appi. Phys., Vol. 31 (1-9A), pp. 2925-2930, 1992.
170. K. Murase, N. Yabumoto, and Y. Komine, Thermal Desorption Studies of Silicon Dioxide Deposited by Atmospheric-Pressure Chemical Vapor Deposition Using Tetraethylorthosilicate and Ozone, J. Electrochem. Soc, Vol. 140, No. 6, pp. 1722-1727, 1993.
171. M. Adachi, K. Okuyama, N. Tohge, M. Shimada, J. Sato, and M. Muroyama, Precursor in Atmospheric-Pressure Chemical Vapor Deposition of Silica Films from Tetraethylorthosilicate/Ozone System, Jpn. J. Appi. Phys., Vol. 33 (2-3B), pp. L447-L450, 1994.
172. M. Matsuura, Y. Hayashide, H. Kotani, and H. Abe, Film Characteristics of A P C V D Oxide Using Organic Silicon and Ozone, Jpn. J. Appi. Phys., Vol. 30, No. 7, pp. 1530-1538, 1991.
173. E. J. Kim and W. N. Gill, Modeling of CVD of Silicon Dioxide Using TEOS and Ozone in a Single-Wafer Reactor, J. Electrochem. Soc, Vol. 141, No. 12, pp. 3462-3472, 1994.
174. 2 C V D, Proc. 13th. Int. Symp. Plasma Chemistry (ISPC-13), Vol I I, pp. 737-742, 1997.