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Plasma Chemistry and Plasma Processing

Volumn 16, Issue 1, 1995, Pages S43-S56

Nozzle optimization for dissociated species transport in low pressure plasma chemical vapor deposition

(5) George, C a Candler, G a Young, R b Pfender, E a Heberlein, J a

a UNIVERSITY OF MINNESOTA (United States)

b WESTINGHOUSE ELECTRIC COMPANY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030533645 PISSN: 02724324 EISSN: 15728986 Source Type: Journal
DOI: 10.1007/BF01512626 Document Type: Article

Times cited : (7)

References (17)

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- Analysis od Diamond Growth in Subatmospheric DC Plasma-Gun Reactors
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- Potential Role of Atomic Carbon in Diamond Deposition
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7
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- Nonequilibrium Modeling of Low-Pressure Argon Plasma Jets; Part I:Laminar Flow
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- Chang, C.H.¹ Pfender, E.²

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- Numerical Simulations of Argon Plasma Jets Flowing into Cold Air
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- Chemical Kinetic Data Sheets for High-Temperature Chemical Reactions
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- Gupta, R.N., Yos, J. M., Thompson, R.A., and Lee, K-P. (1990) A Review of Reaction Rates and Thermodynamic and Transport Properties for an 11-Species Air Model for Chemical and Thermal Nonequilibrium Calculations to 30000 K. NASA 1232.

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- Hydrogen/rare-gas optimization by simple boundary layer theory for diamond film deposition in arc-heated gas flows
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- Young, R.M.¹

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