Numerical studies on the nonequilibrium inductively coupled plasma with metal vapor lonization

IEEE Transactions on Plasma Science

Volumn 24, Issue 3, 1996, Pages 1147-1154

  Suekane, Tetsuya ^a   Taya, Tetsuya ^a   Okuno, Yoshihiro ^a   Kabashima, Shigeharu ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ATOMS; CALCULATIONS; CARRIER CONCENTRATION; CESIUM; DIFFUSION; ELECTRONS; IONIZATION; MATHEMATICAL MODELS; NUMERICAL ANALYSIS; PLASMA OSCILLATIONS; RELAXATION PROCESSES;

CESIUM METAL ATOMS; ELECTRON NUMBER DENSITY; FULLY TIME DEPENDENT; INDUCTIVELY COUPLED PLASMA; SINUSOIDAL APPROXIMATION;

PLASMAS;

EID: 0030164263     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.533124     Document Type: Article

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