메뉴 건너뛰기




Volumn 16, Issue 1, 1995, Pages S57-S69

Two-dimensional model for thermal plasma chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0039333713     PISSN: 02724324     EISSN: 15728986     Source Type: Journal    
DOI: 10.1007/BF01512627     Document Type: Article
Times cited : (13)

References (8)
  • 1
    • 84951643968 scopus 로고    scopus 로고
    • M.E. Coltrin and D.S. Dandy, Analysis of diamond growth in subatmospheric dc plasma-gun reactors, J. Appl. Phys.74 (9), 1993.
  • 2
    • 84951643969 scopus 로고    scopus 로고
    • D.S. Dandy and M.E. Coltrin, Relationship between diamond growth rate and hydrocarbon injector location in direct-current arcjet reactors, Appl. Phys. Lett.66 (3), 1995.
  • 3
    • 85025874540 scopus 로고    scopus 로고
    • B.W.Yu and S.L.Girshick, Atomic carbon vapor as a diamond growth precursor in thermal plasmas, J. Appl. Phys.75, 1994.
  • 5
    • 84951643971 scopus 로고    scopus 로고
    • R.J.Kee, F.M.Rupley, and J.A.Miller, CHEMKIN-II: A Fortran Chemical Kinetics Package for the Analysis of Gas Phase Chemical Kinetics, Sandia National Laboratories, September 1989.
  • 6
    • 84951643972 scopus 로고    scopus 로고
    • M.E.Coltrin, R.J.Kee and F.M.Rupley, SURFACE CHEMKIN: A Fortran Package for Analyzing Heterogeneous Chemical Kinetics at a Solid-Surface-Gas-Phase Interface, Sandia National Laboratories, July 1991.
  • 8
    • 84951643973 scopus 로고    scopus 로고
    • C.George, G.Candler, R.Young, E.Pfender and J.Heberlem, Nozzle optimization for dissociated species transport in low pressure plasma chemical vapor deposition, published in the same issue of Plasma Chemistry, Plasma Processing.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.