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Volumn 16, Issue 1, 1995, Pages S57-S69
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Two-dimensional model for thermal plasma chemical vapor deposition
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0039333713
PISSN: 02724324
EISSN: 15728986
Source Type: Journal
DOI: 10.1007/BF01512627 Document Type: Article |
Times cited : (13)
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References (8)
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