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Journal of Applied Physics

Volumn 84, Issue 9, 1998, Pages 4781-4787

Simulation of clustering and transient enhanced diffusion of boron in silicon

(1) Uematsu, Masashi a

a NTT CORPORATION (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007505884 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.368720 Document Type: Article

Times cited : (37)

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