Effects of phosphorus doping on boron transient enhanced diffusion in silicon

Applied Physics Letters

Volumn 70, Issue 9, 1997, Pages 1146-1148

  Huang, M B ^a   Simpson, T W ^a   Mitchell, I V ^a  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001746837     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118509     Document Type: Article

References (15)

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