Wide optical-gap a-SiO:H films prepared by rf glow discharge

Journal of Non-Crystalline Solids

Volumn 210, Issue 2-3, 1997, Pages 148-154

  Das, Debajyoti ^a   Iftiquar, S M ^a   Barua, A K ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ENERGY GAP; FERMI LEVEL; GLOW DISCHARGES; HYDROGENATION; OPTICAL PROPERTIES; PLASMA APPLICATIONS; SEMICONDUCTING SILICON COMPOUNDS;

OPTICAL GAP; RADIOFREQUENCY GLOW DISCHARGE;

AMORPHOUS FILMS;

EID: 0031097779     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(96)00597-2     Document Type: Article

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