Investigation of the silicon-plasma silicon nitride interface with in situ transient photoconductivity measurements

Applied Surface Science

Volumn 103, Issue 1, 1996, Pages 11-18

  Elmiger, J R ^a   Kunst, M ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; ELECTRONIC PROPERTIES; INTERFACES (MATERIALS); OPTICAL VARIABLES MEASUREMENT; PASSIVATION; PHOTOCONDUCTIVITY; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILANES; SILICON NITRIDE; SURFACE STRUCTURE;

INTERFACE RECOMBINATION VELOCITY; MICROWAVE CONDUCTIVITY MEASUREMENT;

SEMICONDUCTING FILMS;

EID: 0030244719     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00471-0     Document Type: Article

References (19)

1. S. Wolf and R.N. Tauber, Silicon Processing for VLSI Era, Vol. 1, Process Technology (Lattice Press, Sunset Beach, CA, 1986).
2. E.H. Nicolian, in: Silicon Nitride and Silicon Dioxide Thin Insulating Films, Eds. A.B. Bibyk, V.J. Kapoor and N.S. Alvi (The Electrochemical Society, Pennington, NJ, 1989) p. 177.
3. R. Hezel, Solid-State Electron. 24 (1981) 863.
4. M. Kunst and G. Beck, J. Appl. Phys. 63 (1988) 1093.
5. M. Schöfthaler and R. Brendel, J. Appl. Phys. 77 (1995) 3162.
6. C. Swiatkowski, A. Sanders, K.-D. Buhre and M. Kunst, J. Appl. Phys. 78 (1995) 1763.
7. A.G. Aberle, S. Glunz and W. Warta, J. Appl. Phys. 71 (1992) 4422.
8. L.R. Doolittle, Nucl. Instr. Meth. B 15 (1986) 227.
9. G. Franz, Vak. Praxis 4 (1991) 274.
10. D.W. Hess, J. Vac. Sci. Technol. A 8 (1990) 1677.
11. R.J. Overstraten and R.P. Mertens, Physics, Technology and Use of Photovoltaics (Hilger, Bristol, 1986).
12. R. Brendel, Appl. Phys. A 60 (1995) 523.
13. J. Schmidt, T. Lauinger, A.G. Aberle and R. Hezel, in: Proc. 13th European Photovoltaic Solar Energy Conf., Nice, 1995, in press.
14. A.G. Aberle, T. Lauinger, I. Schmidt and R. Hezel, Appl. Phys. Lett. 66 (1995) 2828.
15. C. Leguijt et al., in: Proc. 12th European Photovoltaic Solar Energy Conf., Amsterdam, 1994, p. 720.
16. P.S. Peercy and H.J. Stein, in: Proc. Electrochem. Soc. 83(8) (1983) p. 3.
17. J. Kanicki, W.L. Warren, C.H. Seager, M.S. Crowder and P.M. Lenahan, J. Non-Cryst. Solids 137 (1991) 291.
18. L. Zhong and F. Shimura, Appl. Phys. Lett. 62 (1993) 615.
19. J.M. Andrews, B.G. Jackson and W.J. Polito, Appl. Phys. Lett. 34 (1979) 785.