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The CIL technique has been used previously by us to achieve Zn- and Se-rich interface compositions in ZnSe/GaAs(001) heterostructures and to tune the corresponding band offset (see Refs. 12-14). The present work focuses on the structural as opposed to the electronic effect of the CIL.
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Minimum contrast is expected when g×b=0 for dislocations and g×R =0 or integer for the stacking faults, where g identifies the vector of the employed reflection, b the Burgers vector of the partial dislocation, and R the displacement vector of the stacking fault; see G. Thomas and M. J. Goringe, Transmission Electron Microscopy of Materials (Wiley, New York, 1979). More detail is provided in: J.-M. Bonard, J.-D. Ganière, S. Heun, J. J. Paggel, S. Rubini, L. Sorba, and A. Franciosi, Philos Mag. Lett. 75, 219 (1997).
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