Plasma post-hydrogenation of hydrogenated amorphous silicon and germanium

Materials Research Society Symposium - Proceedings

Volumn 420, Issue , 1996, Pages 497-502

  Beyer, W ^a   Zastrow, U ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DIFFUSION; GERMANIUM; HEAT TREATMENT; HYDROGENATION; SECONDARY ION MASS SPECTROMETRY;

AMORPHOUS GERMANIUM; HYDROGEN DIFFUSION; HYDROGEN SOLUBILITY; PLASMA POST HYDROGENATION;

AMORPHOUS SILICON;

EID: 0030379511     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-420-497     Document Type: Conference Paper

References (12)