Photolithography with transparent reflective photomasks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 1, 1998, Pages 98-103

  Qin, Dong ^a   Xia, Younan ^a   Black, Andrew J ^a   Whitesides, George M ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002255341     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589842     Document Type: Article

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