Masks for laser ablation technology: New requirements and challenges

IBM Journal of Research and Development

Volumn 41, Issue 1-2, 1997, Pages 143-148

  Speidell, J L ^a   Pulaski, D P ^a   Patel, R S ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM; DIELECTRIC FILMS; EXCIMER LASERS; LASER ABLATION; MICROELECTRONIC PROCESSING; PHOTOLITHOGRAPHY; POLYMERS; PROJECTION SYSTEMS; QUARTZ;

CHROMIUM COATED QUARTZ MASKS;

MASKS;

EID: 0030653743     PISSN: 00188646     EISSN: None     Source Type: Journal    
DOI: 10.1147/rd.411.0143     Document Type: Article

References (20)

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