Ion projection lithography

Microlithography World

Volumn 6, Issue 4, 1997, Pages 12-14,-16-18

  Mondelli, A A ^a   Berry, I L ^a   Melngailis, J ^a   Gross, G ^a  

^a SCIENCE APPLICATIONS INTERNATIONAL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; IMAGE PROCESSING; SEMICONDUCTOR DEVICE MANUFACTURE;

IMAGE REDUCTION; ION PROJECTION LITHOGRAPHY; PROXIMITY EFFECTS;

ION BEAM LITHOGRAPHY;

EID: 0031223001     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (16)