Analysis of stencil mask distortion in ion projection lithography

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 443-446

  Didenko, L ^a   McIngailis, J ^a   Loschner H ^b   Stengl, G ^b   Chalupka, A ^b   Shimkunas, A ^c  

^a UNIVERSITY OF MARYLAND   (United States)

^b IMS   (Austria)

^c University of North Carolina   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; COMPUTER SIMULATION; ELASTIC MODULI; FINITE ELEMENT METHOD; MASKS; SHRINKAGE; SILICON WAFERS; STRESS RELIEF;

ION PROJECTION LITHOGRAPHY; PERFORATION RING; SILICON MEMBRANE; SOFTWARE PACKAGE ANSYS; STENCIL MASK DISTORTION;

ION BEAM LITHOGRAPHY;

EID: 0031073541     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00182-7     Document Type: Article

References (8)

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