Overlay performance of 180 nm ground rule generation x-ray lithography aligner

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2476-2482

  Chen, A C ^a,b   Flamholz, A L ^a,b   Rippstein, R ^a,b   Fair, R H ^b   Heald, D A ^c   Amodeo, R J ^c  

^a LOCKHEED MARTIN   (United States)

^b IBM MICROELECTRONICS   (United States)

^c Silicon Valley Group   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010366452     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589670     Document Type: Article

References (10)

1. G. Lesoine, K. Kukkonen, and J. Leavey, Proc. SPIE 1263, 131 (1990).
2. A. Chen, A. Flamholz, A. Krasnoperova, R. Rippstein, B. Vampatella, G. Gomba, R. Fair, W. Chu, V. Dimilia, J. Silverman, R. Amodeo, D. Heald, P. Kochersperger, and C. Stahlhammer, Proc. SPIE 3048, 200 (1997).
3. M. Nelson, J. Kreuzer, and G. Gallatin, J. Vac. Sci. Technol. B 12, 3251 (1994).
4. MS-II Axiom System Manual, SVGL.
5. P. Dirksen, C. Juffermans, A. Leeuwestein, C. Mutsaers, A. Nuijs, R. Pellens, R. Wolters, and J. Gemen, Proc. SPIE 3050, 102 (1997).
6. A. Wilson, C. Lapadula, J. Silverman, R. Viswanathan, and H. Voelker, J. Vac. Sci. Technol. B 7, 1705 (1989).
7. A. Chen, C. Progler, F. Couch, T. Gunther, R. Fair, and K. Cooper, J. Vac. Sci. Technol. B 10, 2628 (1992).
8. A. Chen, S. Lalapet, and J. Maldonado, J. Vac. Sci. Technol. B 9, 3306 (1991).
9. D. Lair and R. Engelstad, J. Vac. Sci. Technol. B 9, 3333 (1991).
10. M. Nelson, DALP memo, 94-DALP-MN-1574 (Revision A), 1994.