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Volumn 83, Issue 10, 1998, Pages 5576-5581

A deep level transient spectroscopy characterization of defects induced in epitaxially grown n-Si by low-energy He-ion bombardment

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Indexed keywords


EID: 0001271435     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367395     Document Type: Article
Times cited : (17)

References (20)
  • 16
    • 21544436076 scopus 로고
    • W. Ting, H. Hwang, J. Lee, and D. L. Kwong, J. Appl. Phys. 70, 1072 (1991); C. Lin, A. I. Chou, P. Choudhury, J. C. Lee, K. Kumar, B. Doyle, and H. R. Soleimani, Appl. Phys. Lett. 69, 3701 (1996).
    • (1991) J. Appl. Phys. , vol.70 , pp. 1072
    • Ting, W.1    Hwang, H.2    Lee, J.3    Kwong, D.L.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.