Mechanism maps for electromigration-induced failure of metal and alloy interconnects

Journal of Applied Physics

Volumn 86, Issue 12, 1999, Pages 6737-6745

  Andleigh, Vaibhav K ^a   Srikar, V T ^a   Park, Young Joon ^a,b   Thompson, Carl V ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000916994     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371750     Document Type: Article

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