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Volumn 46, Issue 11, 1998, Pages 3733-3743

Current density and line width effects in electromigration: A new damage-based lifetime model

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0012941592     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(97)00245-0     Document Type: Article
Times cited : (26)

References (53)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.