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Journal of Applied Physics

Volumn 88, Issue 11, 2000, Pages 6346-6354

The effect of postgrowth ion irradiation on the microstructure and the interface properties of amorphous carbon films on silicon

(2) Patsalas, P a Logothetidis, S a

a ARISTOTLE UNIVERSITY OF THESSALONIKI (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000834448 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1323751 Document Type: Article

Times cited : (17)

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