|
Volumn 82, Issue 10, 1997, Pages 5017-5020
|
Properties and density of states of the interface between silicon and carbon films rich in sp3 bonds
|
Author keywords
[No Author keywords available]
|
Indexed keywords
CARBON INTERFACE;
CONDUCTANCE TECHNIQUES;
DENSITY OF INTERFACE STATE;
DENSITY OF STATE;
ELECTRONIC APPLICATION;
GROWTH PROCESS;
INTERFACE STATE;
LOW SUBSTRATE TEMPERATURE;
ORDER OF MAGNITUDE;
RF-MAGNETRON SPUTTERING;
ROOM TEMPERATURE;
SI(1 0 0);
AMORPHOUS CARBON;
AMORPHOUS FILMS;
AMORPHOUS SILICON;
MAGNETRON SPUTTERING;
CARBON FILMS;
|
EID: 0000272691
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.366402 Document Type: Article |
Times cited : (24)
|
References (16)
|