Simulations of reactive sputtering with constant voltage power supply

Journal of Applied Physics

Volumn 84, Issue 11, 1998, Pages 6399-6408

  Zhu, Shenglong ^a,b   Wang, Fuhui ^a,b   Wu, Weitao ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

^b Young Scientists Lab for Surf Eng   (China)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001405975     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368966     Document Type: Article

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