Modelling of reactive magnetron sputtering used for the deposition of thin films

Vide: Science, Technique et Applications

Volumn 53, Issue 284 SUPPL. 1, 1997, Pages 219-221

  Rousselot, C ^a   Martin, N ^a  

^a Lab de Metrologie des Interfaces T   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHROMIUM COMPOUNDS; COMPUTER SIMULATION; DEPOSITION; FILM PREPARATION; HYSTERESIS; MATHEMATICAL MODELS; OXYGEN; SPUTTER DEPOSITION; THIN FILMS; TITANIUM COMPOUNDS;

REACTIVE GAS GETTERING; REACTIVE MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0031120233     PISSN: 12660167     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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