Overlay accuracy of Canon synchrotron radiation stepper XFPA for 0.15 μm process

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4303-4307

  Saitoh, K ^a   Ohsawa, H ^a   Sentoku, K ^a   Matsumoto, T ^a   Mizusawa, N ^a   Fukuda, Y ^a   Uda, K ^a   Sumitani, H ^b   Hifumi, T ^b  

^a CANON INC   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 5344261814     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589041     Document Type: Article

References (5)

1. N. Mizusawa, K. Saitoh, Y. Fukuda, K. Uda, and S. Uzawa, in Proceedings of the International Workshop on x-ray and Extreme Ultraviolet Lithography, 1995 (unpublished).
2. T. Hifumi, H. Sumitani, S. Aya, K. Itoga, H. Ohsawa, and K. Saitoh, in Proceedings of the 43rd Spring Meeting of The Japan Society of Applied Physics, 1996 (unpublished).
3. H. Sumitani, K. Itoga, H. Shimano, S. Aya, H. Yabe, T. Hifumi, H. Watanabe K. Kise, M. Inoue, K. Marumoto, Y. Nishioka, H. Abe, N. Mizusawa, K. Saitoh, Y. Fukuda, and S. Uzawa, SPIE 2723, 222 (1996).
4. K. Sentoku, K. Saitoh, N. Nose, and M. Yoshii, in Proceedings of the 52nd Autumn Meeting of The Japan Society of Applied Physics, 1991 (unpublished).
5. H. Ohsawa, K. Saitoh, K. Sentoku, T. Matumoto, H. Sumitani, and T. Hifumi, in Proceedings of the 43rd Spring Meeting of The Japan Society of Applied Physics, 1996 (unpublished).