High volume production stepper for X-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 168-175

  Simon, K ^a   MacKim, R ^a   Selzer, R ^a   Leonard, Q ^b   Cerrina, F ^b  

^a Suss Advanced Lithography Inc   (United States)

^b Center for X ray Lithography   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN; GALLIUM ARSENIDE; III-V SEMICONDUCTORS; LASER INTERFEROMETRY; X RAY LITHOGRAPHY;

ADVANCED LITHOGRAPHY; DESIGN AND CONSTRUCTION; DEVICE FABRICATIONS; HIGH-VOLUME PRODUCTION; INDUSTRY REQUIREMENTS; LASER INTERFEROMETRIC; OPTICAL ALIGNMENT SYSTEMS; UNIVERSITY OF WISCONSIN;

X RAYS;

EID: 0037754947     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275773     Document Type: Conference Paper

References (14)

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