Evaluation of the defense advanced lithography program (DALP) X-ray lithography aligner

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 200-210

  Chen, A C ^a   Flamholz, A L ^a   Krasnoperova, A ^a   Rippstein, R P ^a   Vampatella, B R ^a   Gomba, G A ^b   Fair, R H ^b   Chu, W ^c   Dimilia, V ^d,e   Silverman, J P ^d   Amodeo, R J ^e   Heald, D A ^e   Kochersperger, P C ^e   Stahlhammer, C ^e  

^a LOCKHEED MARTIN   (United States)

^b IBM MICROELECTRONICS   (United States)

^c MOTOROLA INC   (United States)

^d IBM RESEARCH   (United States)

^e M/S 928   (United States)

Author keywords

Lithographic equipment; X ray lithography; X ray lithography aligner

Indexed keywords

ALIGNMENT; MASKS; NETWORK SECURITY;

ADVANCED LITHOGRAPHY; LINE-WIDTH CONTROL; LITHOGRAPHIC EQUIPMENTS; PERFORMANCE PARAMETERS; PROXIMITY X-RAY LITHOGRAPHIES; SYNCHROTRON BEAMLINES; SYSTEM'S PERFORMANCE; X RAY IMAGE SENSOR;

X RAY LITHOGRAPHY;

EID: 0010319419     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275803     Document Type: Conference Paper

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