Pellicles for X-ray lithography masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 245-254

  Maldonado, J R ^a   Cordes, S ^a   Leavey, J ^a   Acosta, R ^a   Doany, F ^a   Angelopoulus, M ^a   Waskiewicz, C ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; PRINTING; THIN FILMS; X RAY DIFFRACTION;

X-RAY LITHOGRAPHIC MASKS;

X RAY LITHOGRAPHY;

EID: 0032401364     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309611     Document Type: Conference Paper

References (6)

1. Simulation of X-ray mask defect printability
2. X-ray induced mask contamination and particulate monitoring in X-ray steppers
3. Spurious effects caused by the continuum radiation and ejected electrons in X-ray lithography
4. Image placement errors in X-ray masks induced by changes in resist stress during electron beam writing
5. Accelerated radiation damage testing of X-ray mask membrane materials