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Journal of Photopolymer Science and Technology

Volumn 12, Issue 3, 1999, Pages 509-514

193nm lithography with novel highly transparent acid amplifier for chemically amplified resists

(6) Naito, Takuya a,b Ohfuji, Takeshi a Endo, Masayuki a Morimoto, Hiroaki a Arimitsu, Koji a Ichimura, Kunihiro a

a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

b TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

193 nm; Acid amplification; Acid amplified resist; ArF; Chemical amplified resist

Indexed keywords

EID: 0000348528 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.12.509 Document Type: Article

Times cited : (17)

References (31)

1
- 0001403006
- S. Takechi, Y. Kaimoto, K. Nozaki and N. Abe; J. Photopolym. Sci. Technol. , 5 (1992) 439
- (1992) J. Photopolym. Sci. Technol. , vol.5 , pp. 439
- Takechi, S.¹ Kaimoto, Y.² Nozaki, K.³ Abe, N.⁴

2
- 0001804554
- R. D. Allen, G. M. Wallraff, W. D. Hinsberg, W. E. Conley and R. R. Kunz; Solid State Technol. , 36 (1993) 53
- (1993) Solid State Technol. , vol.36 , pp. 53
- Allen, R.D.¹ Wallraff, G.M.² Hinsberg, W.D.³ Conley, W.E.⁴ Kunz, R.R.⁵

3
- 85024344437
- R. D. Allen, G. M. Wallraff, W. D. Hinsberg, W. E. Conley and R. R. Kunz; J. Photopolym. Sci. Technol. , 6 (1993) 575
- (1993) J. Photopolym. Sci. Technol. , vol.6 , pp. 575
- Allen, R.D.¹ Wallraff, G.M.² Hinsberg, W.D.³ Conley, W.E.⁴ Kunz, R.R.⁵

4
- 33745529435
- K. Nakano, K. Maeda, S. Iwasa, J. Yano, Y. Ogawa and E. Hasegawa; Proc. SPIE, 2195 (1994) 194
- (1994) Proc. SPIE , vol.2195 , pp. 194
- Nakano, K.¹ Maeda, K.² Iwasa, S.³ Yano, J.⁴ Ogawa, Y.⁵ Hasegawa, E.⁶

5
- 0001892493
- M. Takahashi, S. Takechi, K. Nozaki, Y. Kaimoto and N. Abe; J. Photopolym. Sci. Technol. , 7 (1994) 31
- (1994) J. Photopolym. Sci. Technol. , vol.7 , pp. 31
- Takahashi, M.¹ Takechi, S.² Nozaki, K.³ Kaimoto, Y.⁴ Abe, N.⁵

6
- 0000264312
- R. D. Allen, G. M. Wallraff, R. A. DiPietro, D. C. Hofer and R. R. Kunz; J. Photopolym. Sci. Technol. , 7 (1994) 507
- (1994) J. Photopolym. Sci. Technol. , vol.7 , pp. 507
- Allen, R.D.¹ Wallraff, G.M.² Dipietro, R.A.³ Hofer, D.C.⁴ Kunz, R.R.⁵

7
- 0001625242
- T. Naito, K. Asakawa, N. Shida, T. Ushirogouchi, and M. Nakase; Jpn. J. Appl. Phys. , 33 (1994) 7028
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 7028
- Naito, T.¹ Asakawa, K.² Shida, N.³ Ushirogouchi, T.⁴ Nakase, M.⁵

8
- 0029233594
- M. Takahashi, S. Takechi, Y. Kaimoto, I. Hanyu, N. Abe and K. Nozaki; Proc. SPlE, 2438 (1995) 422
- (1995) Proc. SPlE , vol.2438 , pp. 422
- Takahashi, M.¹ Takechi, S.² Kaimoto, Y.³ Hanyu, I.⁴ Abe, N.⁵ Nozaki, K.⁶

9
- 0029235844
- K. Nakano, K. Maeda, SJwasa, T. Ohfuji and E. Hasegawa; Proc. SPlE, 2438 (1995) 433
- (1995) Proc. SPlE , vol.2438 , pp. 433
- Nakano, K.¹ Maeda, K.² Jwasa³ Ohfuji, T.⁴ Hasegawa, E.⁵

10
- 0029227194
- R. D. Allen, G. M. Wallraff, R. A. DiPietro, D. C. Hofer and R. R. Kunz; Proc. SPlE, 2438 (1995) 474
- (1995) Proc. SPlE , vol.2438 , pp. 474
- Allen, R.D.¹ Wallraff, G.M.² Dipietro, R.A.³ Hofer, D.C.⁴ Kunz, R.R.⁵

11
- 0029748674
- R. R. Kunz, . S. C. Palmateer, A,R. Forte, R. D. Allen, G. M. Wallraff, R. A. DiPietro and D. C. Hofer; Proc. SPlE, 2724 (1996) 365
- (1996) Proc. SPlE , vol.2724 , pp. 365
- Kunz, R.R.¹ Palmateer, S.C.² Forte, R.³ Allen, R.D.⁴ Wallraff, G.M.⁵ Dipietro, R.A.⁶ Hofer, D.C.⁷

12
- 0029727827
- K. Maeda, K. Nakano, T. Ohfuji and E. Hasegawa; Proc. SPlE, 2724 (1996) 377
- (1996) Proc. SPlE , vol.2724 , pp. 377
- Maeda, K.¹ Nakano, K.² Ohfuji, T.³ Hasegawa, E.⁴

13
- 0029727392
- T. Ohfuji, K. Maeda, K. Nakano and E. Hasegawa; Proc. SPlE, 2724 (1996) 386
- (1996) Proc. SPlE , vol.2724 , pp. 386
- Ohfuji, T.¹ Maeda, K.² Nakano, K.³ Hasegawa, E.⁴

14
- 0000813458
- N. Shida, T. Ushirogouchi, K. Asakawa and M. Nakase; J. Photopolym. Sci. Technol. , 9 (1996)457
- (1996) J. Photopolym. Sci. Technol. , vol.9 , pp. 457
- Shida, N.¹ Ushirogouchi, T.² Asakawa, K.³ Nakase, M.⁴

15
- 0000697586
- J. -C. Jung, C. -K. Bok and K. -H. Baik; J. Photopolym. Sci. Technol. , 10 (1997) 529
- (1997) J. Photopolym. Sci. Technol. , vol.10 , pp. 529
- Jung, J.C.¹ Bok, C.K.² Baik, K.H.³

16
- 0001729202
- T. Hattori, Y. Tsuchiya, R. Yamanaka, K. Hattori and H. Shiraishi; J. Photopolym. Sci. TechnoL, 10 (1997)i535
- (1997) J. Photopolym. Sci. TechnoL , vol.10
- Hattori, T.¹ Tsuchiya, Y.² Yamanaka, R.³ Hattori, K.⁴ Shiraishi, H.⁵

17
- 0010225856
- K. Asakawa, T. Ushirogouchi, N. Shida, T. Okino and M. Nakase; J. Photopolym. Sci. Technol. , 10 (1997) 559
- (1997) J. Photopolym. Sci. Technol. , vol.10 , pp. 559
- Asakawa, K.¹ Ushirogouchi, T.² Shida, N.³ Okino, T.⁴ Nakase, M.⁵

18
- 0000993597
- K. Nakano, K. Maeda, S. Iwasa and E. Hasegawa; J. Photopolym. Sci. Technol. , 10 (1997) 561
- (1997) J. Photopolym. Sci. Technol. , vol.10 , pp. 561
- Nakano, K.¹ Maeda, K.² Iwasa, S.³ Hasegawa, E.⁴

19
- 0003126842
- J. -C. Jung, C. -K. Bok and K. -H. Baik; Proc. SPIE, 3333 (1998)11
- (1998) Proc. SPIE , vol.3333 , pp. 11
- Jung, J.C.¹ Bok, C.K.² Baik, K.H.³

20
- 60949092321
- M. Suwa, H. Iwasawa, T. Kajita, M. Yamamoto, S. -I. Iwanaga; Proc. SPIE, 3333 (1998) 26
- (1998) Proc. SPIE , vol.3333 , pp. 26
- Suwa, M.¹ Iwasawa, H.² Kajita, T.³ Yamamoto, M.⁴ Iwanaga, S.I.⁵

21
- 60849085199
- F. M. Houlihan, J. M. Kometani, A. G. Timko, R. S. Hutton, R. A. Cirelli, E. Reichmanis and O. Nalamasu; Proc. SPIE, 3333 (1998) 73
- (1998) Proc. SPIE , vol.3333 , pp. 73
- Houlihan, F.M.¹ Kometani, J.M.² Timko, A.G.³ Hutton, R.S.⁴ Cirelli, R.A.⁵ Reichmanis, E.⁶ Nalamasu, O.⁷

22
- 0002750525
- N. Shida, T. Okino, K. Asakawa, T. Ushirogouchi and M. Nakase; Proc. SPIE, 3333 (1998) 102
- (1998) Proc. SPIE , vol.3333 , pp. 102
- Shida, N.¹ Okino, T.² Asakawa, K.³ Ushirogouchi, T.⁴ Nakase, M.⁵

23
- 0000136286
- R. R. Dammel, S. A. Ficner, J. E. Oberlander, A. Klauck-Jacobs, M. Padmanaban, D. N. Khanna and D. L. Durham; Proc. SPIE, 3333 (1998) 144
- (1998) Proc. SPIE , vol.3333 , pp. 144
- Dammel, R.R.¹ Ficner, S.A.² Oberlander, J.E.³ Klauck-Jacobs, A.⁴ Padmanaban, M.⁵ Khanna, D.N.⁶ Durham, D.L.⁷

24
- 0000132727
- K. Ichimura, K. Arimitsu and K. Kudo; Chem. Lett. ,( 1995) 551
- Chem. Lett. , vol.1995 , pp. 551
- Ichimura, K.¹ Arimitsu, K.² Kudo, K.³

25
- 0041447447
- K. Arimitsu, K. Kudo, H. Ohmori and K. Ichimura; J. Photopolym. Sci. Technol. , 8 (1995)43
- (1995) J. Photopolym. Sci. Technol. , vol.8 , pp. 43
- Arimitsu, K.¹ Kudo, K.² Ohmori, H.³ Ichimura, K.⁴

26
- 0002369062
- K. Kudo, K. Arimitsu, H. Ohmori and K. Ichimura; J. Photopolym. Sci. Technol. , 8 (1995) 45
- (1995) J. Photopolym. Sci. Technol. , vol.8 , pp. 45
- Kudo, K.¹ Arimitsu, K.² Ohmori, H.³ Ichimura, K.⁴

27
- 0029696723
- K. Kudo, K. Arimitsu, and K. Ichimura; Mol. Cryst. Liq. Cryst. , 280 (1996) 307
- (1996) Mol. Cryst. Liq. Cryst. , vol.280 , pp. 307
- Kudo, K.¹ Arimitsu, K.² Ichimura, K.³

28
- 0002827275
- K. Arimitsu, K. Kudo, Y. Hayashi and K. Ichimura; J. Photopolym. Sci. Technol. , 9 (1996) 29
- (1996) J. Photopolym. Sci. Technol. , vol.9 , pp. 29
- Arimitsu, K.¹ Kudo, K.² Hayashi, Y.³ Ichimura, K.⁴

29
- 0344475621
- T. Ohfuji, M. Takahashi, K. Kuhara, T. Ogawa, H. Ohtsuka, M. Sasago and K. Ichimura; Proc. SPIE, 3049 (1997) 76
- (1997) Proc. SPIE , vol.3049 , pp. 76
- Ohfuji, T.¹ Takahashi, M.² Kuhara, K.³ Ogawa, T.⁴ Ohtsuka, H.⁵ Sasago, M.⁶ Ichimura, K.⁷

30
- 0000618983
- T. Ohfuji, M. Takahashi, M. Sasago S. Noguchi and K. Ichimura; J. Photopolym. Sci. Technol. , 10(1997)551
- (1997) J. Photopolym. Sci. Technol. , vol.10 , pp. 551
- Ohfuji, T.¹ Takahashi, M.² Sasago, M.³ Noguchi, S.⁴ Ichimura, K.⁵

31
- 0003491754
- Butterworth and Co. Ltd. , London Chap.
- C. N. R. Rao; "Ultra-violet and Visible Spectroscopy: Second ed. " Butterworth and Co. Ltd. , London Chap. 5 (1967)
- (1967) Ultra-violet and Visible Spectroscopy: Second Ed. , vol.5
- Rao, C.N.R.¹

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