Characterization of chemically amplified resists with "acid amplifier" for 193 nm lithography

Journal of Photopolymer Science and Technology

Volumn 10, Issue 4, 1997, Pages 551-558

  Ohfuji, Takeshi ^a   Takahashi, Makoto ^a   Sasago, Masaru ^a   Noguchi, Soh ^b   Ichimura, Kunihiro ^b  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

193 nm; Acid amplification; ArF; Chemically amplification; Resist

Indexed keywords

EID: 0000618983     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.551     Document Type: Article

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