Effect of phenolic hydroxyl residues on the improvement of acid-proliferation-type photoimaging materials

Journal of Photopolymer Science and Technology

Volumn 9, Issue 1, 1996, Pages 29-30

  Arimitsu, Koji ^a   Kudo, Kazuaki ^a   Hayashi, Yuko ^a   Ichimura, Kunihiro ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002827275     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.9.29     Document Type: Article

References (7)

1. K. Ichimura, K. Arimitsu, K. Kudo, Chem. Lett. , (1995) 551.
2. K. Arimitsu, K. Kudo, H. Ohmori, K. Ichimura,. J. Photopolym. Sci. Technol. , 8 (1995) 43.
3. K. Kudo, K. Arimitsu, H. Ohmori, K. Ichimura, J. Photopolym. Sci. Technol. , 8 (1995) 45.
4. K. Kudo, K. Arimitsu, K. Ichimura, Mol. Cryst. Liq. Cryst. , submitted
5. H. Ito, C. G. Willson, J. M. J. Frechet, Digest of Technical papers of 1982 Symposium on VLSI Technology, (1982) 86.
6. K. Arimitsu, K. Kudo, H. Ohmori, Y. Hayashi, K. Ichimura, Polymer Preprints Jpn. , 44 (1995) 2005.
7. G. G. Barclay, D. R. Medeiros, R. F. Sinta, Chem. Mater. , 7 (1995) 1315.